Effects of Rf power on structural properties of Nc-Si:H Thin Films deposited by Layer-By-Layer (LbL) deposition technique
The effects of rf power on the structural properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited using layer-by-layer ( LbL) deposition technique in a home-built plasma enhanced chemical vapor deposition (PECVD) system were investigated. The properties of the films were ch...
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Penerbit Universiti Kebangsaan Malaysia
2012
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