Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition
Carbon nitride (CR(x)) thin films were deposited by radio frequency plasma enhanced chemical vapour deposition (rfPECVD) technique from a gas mixture of methane (CH(4)), hydrogen (H(2)) and nitrogen (N(2)). The effects of rf power on the structural properties of CN(x) thin films were discussed in th...
| Main Authors: | , , , , , , |
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| Format: | Article |
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Elsevier
2011
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