Optical properties and crystallinity of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by rf-PECVD

Optical properties and crystallinity of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by rf-PECVD

Hydrogenated nanocrystalline silicon (nc-Si:H) thin films prepared in a home-built radio-frequency (rf) plasma enhanced chemical vapour deposition (PECVD) system have been studied. The rf powers were fixed in the range of 5 W-80 W. The optical properties and crystallinity of the films were studied b...

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Bibliographic Details
Main Authors:	Tong, G.B., Aspanut, Z., Muhamad, M.R., Rahman, S.A.
Format:	Article
Published:	2012
Subjects:	QC Physics

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