Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams
Hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by radio-frequency plasma enhanced chemical vapour deposition was irradiated by an energetic ion beam source from a 3.3 kJ Mather type dense plasma focus device. The effects of the energetic ion beam irradiations on the structural a...
| Main Authors: | , , , , , |
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| Format: | Article |
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2013
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