An Optimized Machine Learning and Deep Learning Framework for Facial and Masked Facial Recognition

In this study, we aimed to find an optimized approach to improving facial and masked facial recognition using machine learning and deep learning techniques. Prior studies only used a single machine learning model for classification and did not report optimal parameter values. In contrast, we utilize...

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Main Authors: Putthiporn Thanathamathee, Siriporn Sawangarreerak, Prateep Kongkla, Dinna @ Nina Mohd Nizam
Format: Article
Language:English
English
Published: Ital Publication 2023
Subjects:
Online Access:https://eprints.ums.edu.my/id/eprint/38433/1/ABSTRACT.pdf
https://eprints.ums.edu.my/id/eprint/38433/2/FULL%20TEXT.pdf
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author Putthiporn Thanathamathee
Siriporn Sawangarreerak
Prateep Kongkla
Dinna @ Nina Mohd Nizam
author_facet Putthiporn Thanathamathee
Siriporn Sawangarreerak
Prateep Kongkla
Dinna @ Nina Mohd Nizam
author_sort Putthiporn Thanathamathee
collection UMS
description In this study, we aimed to find an optimized approach to improving facial and masked facial recognition using machine learning and deep learning techniques. Prior studies only used a single machine learning model for classification and did not report optimal parameter values. In contrast, we utilized a grid search with hyperparameter tuning and nested cross-validation to achieve better results during the verification phase. We performed experiments on a large dataset of facial images with and without masks. Our findings showed that the SVM model with hyperparameter tuning had the highest accuracy compared to other models, achieving a recognition accuracy of 0.99912. The precision values for recognition without masks and with masks were 0.99925 and 0.98417, respectively. We tested our approach in real-life scenarios and found that it accurately identified masked individuals through facial recognition. Furthermore, our study stands out from others as it incorporates hyperparameter tuning and nested cross-validation during the verification phase to enhance the model's performance, generalization, and robustness while optimizing data utilization. Our optimized approach has potential implications for improving security systems in various domains, including public safety and healthcare.
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spelling ums.eprints-384332024-03-04T04:17:23Z https://eprints.ums.edu.my/id/eprint/38433/ An Optimized Machine Learning and Deep Learning Framework for Facial and Masked Facial Recognition Putthiporn Thanathamathee Siriporn Sawangarreerak Prateep Kongkla Dinna @ Nina Mohd Nizam QA75.5-76.95 Electronic computers. Computer science T1-995 Technology (General) In this study, we aimed to find an optimized approach to improving facial and masked facial recognition using machine learning and deep learning techniques. Prior studies only used a single machine learning model for classification and did not report optimal parameter values. In contrast, we utilized a grid search with hyperparameter tuning and nested cross-validation to achieve better results during the verification phase. We performed experiments on a large dataset of facial images with and without masks. Our findings showed that the SVM model with hyperparameter tuning had the highest accuracy compared to other models, achieving a recognition accuracy of 0.99912. The precision values for recognition without masks and with masks were 0.99925 and 0.98417, respectively. We tested our approach in real-life scenarios and found that it accurately identified masked individuals through facial recognition. Furthermore, our study stands out from others as it incorporates hyperparameter tuning and nested cross-validation during the verification phase to enhance the model's performance, generalization, and robustness while optimizing data utilization. Our optimized approach has potential implications for improving security systems in various domains, including public safety and healthcare. Ital Publication 2023 Article NonPeerReviewed text en https://eprints.ums.edu.my/id/eprint/38433/1/ABSTRACT.pdf text en https://eprints.ums.edu.my/id/eprint/38433/2/FULL%20TEXT.pdf Putthiporn Thanathamathee and Siriporn Sawangarreerak and Prateep Kongkla and Dinna @ Nina Mohd Nizam (2023) An Optimized Machine Learning and Deep Learning Framework for Facial and Masked Facial Recognition. Emerging Science Journal, 7 (4). pp. 1173-1187. ISSN 2610-9182 https://doi.org/10.28991/ESJ-2023-07-04-010
spellingShingle QA75.5-76.95 Electronic computers. Computer science
T1-995 Technology (General)
Putthiporn Thanathamathee
Siriporn Sawangarreerak
Prateep Kongkla
Dinna @ Nina Mohd Nizam
An Optimized Machine Learning and Deep Learning Framework for Facial and Masked Facial Recognition
title An Optimized Machine Learning and Deep Learning Framework for Facial and Masked Facial Recognition
title_full An Optimized Machine Learning and Deep Learning Framework for Facial and Masked Facial Recognition
title_fullStr An Optimized Machine Learning and Deep Learning Framework for Facial and Masked Facial Recognition
title_full_unstemmed An Optimized Machine Learning and Deep Learning Framework for Facial and Masked Facial Recognition
title_short An Optimized Machine Learning and Deep Learning Framework for Facial and Masked Facial Recognition
title_sort optimized machine learning and deep learning framework for facial and masked facial recognition
topic QA75.5-76.95 Electronic computers. Computer science
T1-995 Technology (General)
url https://eprints.ums.edu.my/id/eprint/38433/1/ABSTRACT.pdf
https://eprints.ums.edu.my/id/eprint/38433/2/FULL%20TEXT.pdf
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