The snomipede : a parallel platform for scanning near-field photolithography.
Using scanning near-field lithography (SNP), it is possible to pattern molecules at surfaces with a resolution as good as 9 nm [M. Montague, R. E. Ducker, K. S. L. Chong, R. J. Manning, F. J. M. Rutten, M. C. Davies and G. J. Leggett, Langmuir 23 (13), 7328–7337 (2007)]. However, in common with othe...
| Main Authors: | , , , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English English |
| Published: |
Materials Research Society
2011
|
| Online Access: | http://psasir.upm.edu.my/id/eprint/25237/1/The%20snomipede%20a%20parallel%20platform%20for%20scanning%20near-field%20photolithography..pdf |
| _version_ | 1825925737230630912 |
|---|---|
| author | Ul-Haq, Ehtsham Zhuming, Liu Zhang, Yuan Alang Ahmad, Shahrul Ainliah Wong, Lu Shin Hobbs, Jamie K. Leggett, Graham J. Micklefield, Jason Roberts, Clive J. Weaver, John M. R. |
| author_facet | Ul-Haq, Ehtsham Zhuming, Liu Zhang, Yuan Alang Ahmad, Shahrul Ainliah Wong, Lu Shin Hobbs, Jamie K. Leggett, Graham J. Micklefield, Jason Roberts, Clive J. Weaver, John M. R. |
| author_sort | Ul-Haq, Ehtsham |
| collection | UPM |
| description | Using scanning near-field lithography (SNP), it is possible to pattern molecules at surfaces with a resolution as good as 9 nm [M. Montague, R. E. Ducker, K. S. L. Chong, R. J. Manning, F. J. M. Rutten, M. C. Davies and G. J. Leggett, Langmuir 23 (13), 7328–7337 (2007)]. However, in common with other scanning probe techniques, SNP has previously been considered a serial process, hindering its use in many applications. IBM’s “Millipede” addresses this problem by utilizing an array of local probes operating in parallel. Here, we describe the construction of two instruments (Snomipedes) that integrate near-field optical methods into the parallel probe paradigm and promise the integration of top–down and bottom–up fabrication methods over macroscopic areas. Both are capable of performing near-field lithography with 16 probes in parallel spanning approximately 2 mm. The instruments can work in both ambient and liquid environments, key to many applications in nanobiology. In both, separate control of writing is possible for each probe. We demonstrate the deprotection of self-assembled monolayers of alkylsilanes with photocleavable protecting groups and subsequent growth of nanostructured polymer brushes from these nanopatterned surfaces by atom-transfer radical polymerization. |
| first_indexed | 2024-03-06T08:02:14Z |
| format | Article |
| id | upm.eprints-25237 |
| institution | Universiti Putra Malaysia |
| language | English English |
| last_indexed | 2024-03-06T08:02:14Z |
| publishDate | 2011 |
| publisher | Materials Research Society |
| record_format | dspace |
| spelling | upm.eprints-252372015-10-07T02:32:22Z http://psasir.upm.edu.my/id/eprint/25237/ The snomipede : a parallel platform for scanning near-field photolithography. Ul-Haq, Ehtsham Zhuming, Liu Zhang, Yuan Alang Ahmad, Shahrul Ainliah Wong, Lu Shin Hobbs, Jamie K. Leggett, Graham J. Micklefield, Jason Roberts, Clive J. Weaver, John M. R. Using scanning near-field lithography (SNP), it is possible to pattern molecules at surfaces with a resolution as good as 9 nm [M. Montague, R. E. Ducker, K. S. L. Chong, R. J. Manning, F. J. M. Rutten, M. C. Davies and G. J. Leggett, Langmuir 23 (13), 7328–7337 (2007)]. However, in common with other scanning probe techniques, SNP has previously been considered a serial process, hindering its use in many applications. IBM’s “Millipede” addresses this problem by utilizing an array of local probes operating in parallel. Here, we describe the construction of two instruments (Snomipedes) that integrate near-field optical methods into the parallel probe paradigm and promise the integration of top–down and bottom–up fabrication methods over macroscopic areas. Both are capable of performing near-field lithography with 16 probes in parallel spanning approximately 2 mm. The instruments can work in both ambient and liquid environments, key to many applications in nanobiology. In both, separate control of writing is possible for each probe. We demonstrate the deprotection of self-assembled monolayers of alkylsilanes with photocleavable protecting groups and subsequent growth of nanostructured polymer brushes from these nanopatterned surfaces by atom-transfer radical polymerization. Materials Research Society 2011 Article PeerReviewed application/pdf en http://psasir.upm.edu.my/id/eprint/25237/1/The%20snomipede%20a%20parallel%20platform%20for%20scanning%20near-field%20photolithography..pdf Ul-Haq, Ehtsham and Zhuming, Liu and Zhang, Yuan and Alang Ahmad, Shahrul Ainliah and Wong, Lu Shin and Hobbs, Jamie K. and Leggett, Graham J. and Micklefield, Jason and Roberts, Clive J. and Weaver, John M. R. (2011) The snomipede : a parallel platform for scanning near-field photolithography. Journal of Materials Research, 26 (24). pp. 2997-3008. ISSN 0884-2914; ESSN:2044-5326 10.1557/jmr.2011.370 English |
| spellingShingle | Ul-Haq, Ehtsham Zhuming, Liu Zhang, Yuan Alang Ahmad, Shahrul Ainliah Wong, Lu Shin Hobbs, Jamie K. Leggett, Graham J. Micklefield, Jason Roberts, Clive J. Weaver, John M. R. The snomipede : a parallel platform for scanning near-field photolithography. |
| title | The snomipede : a parallel platform for scanning near-field photolithography. |
| title_full | The snomipede : a parallel platform for scanning near-field photolithography. |
| title_fullStr | The snomipede : a parallel platform for scanning near-field photolithography. |
| title_full_unstemmed | The snomipede : a parallel platform for scanning near-field photolithography. |
| title_short | The snomipede : a parallel platform for scanning near-field photolithography. |
| title_sort | snomipede a parallel platform for scanning near field photolithography |
| url | http://psasir.upm.edu.my/id/eprint/25237/1/The%20snomipede%20a%20parallel%20platform%20for%20scanning%20near-field%20photolithography..pdf |
| work_keys_str_mv | AT ulhaqehtsham thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT zhumingliu thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT zhangyuan thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT alangahmadshahrulainliah thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT wonglushin thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT hobbsjamiek thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT leggettgrahamj thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT micklefieldjason thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT robertsclivej thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT weaverjohnmr thesnomipedeaparallelplatformforscanningnearfieldphotolithography AT ulhaqehtsham snomipedeaparallelplatformforscanningnearfieldphotolithography AT zhumingliu snomipedeaparallelplatformforscanningnearfieldphotolithography AT zhangyuan snomipedeaparallelplatformforscanningnearfieldphotolithography AT alangahmadshahrulainliah snomipedeaparallelplatformforscanningnearfieldphotolithography AT wonglushin snomipedeaparallelplatformforscanningnearfieldphotolithography AT hobbsjamiek snomipedeaparallelplatformforscanningnearfieldphotolithography AT leggettgrahamj snomipedeaparallelplatformforscanningnearfieldphotolithography AT micklefieldjason snomipedeaparallelplatformforscanningnearfieldphotolithography AT robertsclivej snomipedeaparallelplatformforscanningnearfieldphotolithography AT weaverjohnmr snomipedeaparallelplatformforscanningnearfieldphotolithography |