Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell

Compact TiO2 has been introduced onto the surface of an indium tin oxide glass slide (ITO), using an aerosol-assisted chemical vapour deposition method. This serves as a blocking layer for a dye-sensitised solar cell (DSSC). The thickness of the compact TiO2 could be controlled by deposition time. X...

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Bibliographic Details
Main Authors: Lim, Su Pei, Huang, Nay Ming, Lim, Hong Ngee, Mazhar, Muhammad
Format: Article
Language:English
Published: Elsevier 2014
Online Access:http://psasir.upm.edu.my/id/eprint/36339/1/Aerosol%20assisted%20chemical%20vapour%20deposited.pdf
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Summary:Compact TiO2 has been introduced onto the surface of an indium tin oxide glass slide (ITO), using an aerosol-assisted chemical vapour deposition method. This serves as a blocking layer for a dye-sensitised solar cell (DSSC). The thickness of the compact TiO2 could be controlled by deposition time. X-ray diffraction and Raman spectroscopy analyses reveal that the compact TiO2 is made up of mixed anatase and rutile phases. The field emission scanning electron microscopy image displays a pyramidal morphology of the compact TiO2. A layer of P25 paste was then smeared onto the compact TiO2-modified ITO, using the doctor's blade method. A post-treatment procedure was applied to remove the contaminants from the prepared hybrid film, by immersing in a hydrochloric acid solution. The photoelectrochemical measurements and J–V characterisation of the hybrid film show an approximately fourfold increase in photocurrent density generation (114.22 µA/cm2), and approximately 25% enhancement of DSSC conversion efficiency (4.63%), compared to the acid-treated P25 paste alone (3.68%).