Plasma polymerization of silicon-containing monomers
Plasma depositions of ultra thin films from seven silicon-containing liquid monomers were investigated using a continuos wave (CW) plasma source. The deposition rate of plasma polymerized films were determined using a quartz crystal microbalance (QCM) technique while the film composition were determ...
| Main Authors: | , , , , , , , , , , |
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| Format: | Article |
| Language: | English English |
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The Society of Photopolymer Science and Technology
2001
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| Online Access: | http://psasir.upm.edu.my/id/eprint/48661/1/Plasma%20polymerization%20of%20silicon-containing%20monomers.pdf http://psasir.upm.edu.my/id/eprint/48661/7/14_129.pdf |
| _version_ | 1825930049422884864 |
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| author | Talib, Zainal Abidin Kurosawa, Shigeru Atthoff, Bjorn Aizawa, Hidenobu Kashima, Kazuya Hirokawa, Tomoya Yoshimi, Yasuo Yoshimoto, Minoru Hirotsu, Toshihiro Miyake, Jun Hilborn, Jons |
| author_facet | Talib, Zainal Abidin Kurosawa, Shigeru Atthoff, Bjorn Aizawa, Hidenobu Kashima, Kazuya Hirokawa, Tomoya Yoshimi, Yasuo Yoshimoto, Minoru Hirotsu, Toshihiro Miyake, Jun Hilborn, Jons |
| author_sort | Talib, Zainal Abidin |
| collection | UPM |
| description | Plasma depositions of ultra thin films from seven silicon-containing liquid monomers were investigated using a continuos wave (CW) plasma source. The deposition rate of plasma polymerized films were determined using a quartz crystal microbalance (QCM) technique while the film composition were determined spectroscopiclly using primarily X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared method (FT-IR). The wettability of the plasma-polymerized films was also investigated by measuring the contact angles of water on the film surfaces. It was observed that the C=C absorption band was not present in these films. This observation is consistent with selective polymerization through the double bond. Oxygen was present in all samples investigated and this may be attributed to the quenching of radicals in the film by reactions with oxygen when exposed to atmosphere. |
| first_indexed | 2024-03-06T09:05:43Z |
| format | Article |
| id | upm.eprints-48661 |
| institution | Universiti Putra Malaysia |
| language | English English |
| last_indexed | 2024-09-25T03:34:33Z |
| publishDate | 2001 |
| publisher | The Society of Photopolymer Science and Technology |
| record_format | dspace |
| spelling | upm.eprints-486612024-08-08T04:56:09Z http://psasir.upm.edu.my/id/eprint/48661/ Plasma polymerization of silicon-containing monomers Talib, Zainal Abidin Kurosawa, Shigeru Atthoff, Bjorn Aizawa, Hidenobu Kashima, Kazuya Hirokawa, Tomoya Yoshimi, Yasuo Yoshimoto, Minoru Hirotsu, Toshihiro Miyake, Jun Hilborn, Jons Plasma depositions of ultra thin films from seven silicon-containing liquid monomers were investigated using a continuos wave (CW) plasma source. The deposition rate of plasma polymerized films were determined using a quartz crystal microbalance (QCM) technique while the film composition were determined spectroscopiclly using primarily X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared method (FT-IR). The wettability of the plasma-polymerized films was also investigated by measuring the contact angles of water on the film surfaces. It was observed that the C=C absorption band was not present in these films. This observation is consistent with selective polymerization through the double bond. Oxygen was present in all samples investigated and this may be attributed to the quenching of radicals in the film by reactions with oxygen when exposed to atmosphere. The Society of Photopolymer Science and Technology 2001 Article PeerReviewed text en http://psasir.upm.edu.my/id/eprint/48661/1/Plasma%20polymerization%20of%20silicon-containing%20monomers.pdf text en http://psasir.upm.edu.my/id/eprint/48661/7/14_129.pdf Talib, Zainal Abidin and Kurosawa, Shigeru and Atthoff, Bjorn and Aizawa, Hidenobu and Kashima, Kazuya and Hirokawa, Tomoya and Yoshimi, Yasuo and Yoshimoto, Minoru and Hirotsu, Toshihiro and Miyake, Jun and Hilborn, Jons (2001) Plasma polymerization of silicon-containing monomers. Journal of Photopolymer Science and Technology, 14 (1). pp. 129-138. ISSN 0914-9244; ESSN: 1349-6336 https://www.jstage.jst.go.jp/article/photopolymer1988/14/1/14_1_129/_article 10.2494/photopolymer.14.129 |
| spellingShingle | Talib, Zainal Abidin Kurosawa, Shigeru Atthoff, Bjorn Aizawa, Hidenobu Kashima, Kazuya Hirokawa, Tomoya Yoshimi, Yasuo Yoshimoto, Minoru Hirotsu, Toshihiro Miyake, Jun Hilborn, Jons Plasma polymerization of silicon-containing monomers |
| title | Plasma polymerization of silicon-containing monomers |
| title_full | Plasma polymerization of silicon-containing monomers |
| title_fullStr | Plasma polymerization of silicon-containing monomers |
| title_full_unstemmed | Plasma polymerization of silicon-containing monomers |
| title_short | Plasma polymerization of silicon-containing monomers |
| title_sort | plasma polymerization of silicon containing monomers |
| url | http://psasir.upm.edu.my/id/eprint/48661/1/Plasma%20polymerization%20of%20silicon-containing%20monomers.pdf http://psasir.upm.edu.my/id/eprint/48661/7/14_129.pdf |
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