Al0.15Ga0.85N/GaN Heterostructure Field Effect Transistors (HFET)Device Structure Optimization And Thermal Effects.
Al0.15Ga0.85N/GaN heterostructure field effect transistors (HFETs) was simulated by using ISETCAD software with varying substrate type, gate length and source drain resistances.
Үндсэн зохиолчид: | Thahab, S M, Abu Hassan, H., Hassan, Z. |
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Формат: | Conference or Workshop Item |
Хэл сонгох: | English |
Хэвлэсэн: |
2007
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Нөхцлүүд: | |
Онлайн хандалт: | http://eprints.usm.my/14835/1/paper10.pdf |
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