Al0.15Ga0.85N/GaN Heterostructure Field Effect Transistors (HFET)Device Structure Optimization And Thermal Effects.

Al0.15Ga0.85N/GaN heterostructure field effect transistors (HFETs) was simulated by using ISETCAD software with varying substrate type, gate length and source drain resistances.

Номзүйн дэлгэрэнгүй
Үндсэн зохиолчид: Thahab, S M, Abu Hassan, H., Hassan, Z.
Формат: Conference or Workshop Item
Хэл сонгох:English
Хэвлэсэн: 2007
Нөхцлүүд:
Онлайн хандалт:http://eprints.usm.my/14835/1/paper10.pdf

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