Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications

CuAlO2 is a p-type oxide which is transparent. When coupled with an n-type material, a p-n junction can be created and can be used in many interesting optical and electronic applications. Smooth, crack free and homogenous CuAlO2 film was produced by chemical solution deposition process via ultrasoni...

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Main Author: Suhariadi, Iping
Format: Thesis
Language:English
Published: 2011
Subjects:
Online Access:http://eprints.usm.my/43322/1/IPING%20SUHARIADI.pdf
_version_ 1825834777504120832
author Suhariadi, Iping
author_facet Suhariadi, Iping
author_sort Suhariadi, Iping
collection USM
description CuAlO2 is a p-type oxide which is transparent. When coupled with an n-type material, a p-n junction can be created and can be used in many interesting optical and electronic applications. Smooth, crack free and homogenous CuAlO2 film was produced by chemical solution deposition process via ultrasonic spray pyrolysis (USP) technique on a cleaned n-type Si substrate. The precursor solution used was comprised of a mixture of Cu(NO3)2.3H2O and Al(NO3)3.9H2O. The deposition parameter influences the film properties are the flow rate of carrier gas, nozzle-substrate distance, substrate‘s temperature and Cu to Al ratio was studied thoroughly.
first_indexed 2024-03-06T15:27:47Z
format Thesis
id usm.eprints-43322
institution Universiti Sains Malaysia
language English
last_indexed 2024-03-06T15:27:47Z
publishDate 2011
record_format dspace
spelling usm.eprints-433222019-04-12T05:26:31Z http://eprints.usm.my/43322/ Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications Suhariadi, Iping TN1-997 Mining engineering. Metallurgy CuAlO2 is a p-type oxide which is transparent. When coupled with an n-type material, a p-n junction can be created and can be used in many interesting optical and electronic applications. Smooth, crack free and homogenous CuAlO2 film was produced by chemical solution deposition process via ultrasonic spray pyrolysis (USP) technique on a cleaned n-type Si substrate. The precursor solution used was comprised of a mixture of Cu(NO3)2.3H2O and Al(NO3)3.9H2O. The deposition parameter influences the film properties are the flow rate of carrier gas, nozzle-substrate distance, substrate‘s temperature and Cu to Al ratio was studied thoroughly. 2011-08 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/43322/1/IPING%20SUHARIADI.pdf Suhariadi, Iping (2011) Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications. Masters thesis, Universiti Sains Malaysia.
spellingShingle TN1-997 Mining engineering. Metallurgy
Suhariadi, Iping
Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_full Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_fullStr Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_full_unstemmed Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_short Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_sort formation of cualo2 thin films by ultrasonic spray pyrolysis for photodiode applications
topic TN1-997 Mining engineering. Metallurgy
url http://eprints.usm.my/43322/1/IPING%20SUHARIADI.pdf
work_keys_str_mv AT suhariadiiping formationofcualo2thinfilmsbyultrasonicspraypyrolysisforphotodiodeapplications