Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].

Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolith...

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Main Author: Siow, Yuen Tien
Format: Thesis
Language:English
Published: 2008
Subjects:
Online Access:http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf
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author Siow, Yuen Tien
author_facet Siow, Yuen Tien
author_sort Siow, Yuen Tien
collection USM
description Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolithography
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institution Universiti Sains Malaysia
language English
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publishDate 2008
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spelling usm.eprints-96132017-04-17T09:26:35Z http://eprints.usm.my/9613/ Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. Siow, Yuen Tien TR925-1050 Photomechanical processes Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolithography 2008-11 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf Siow, Yuen Tien (2008) Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. Masters thesis, Universiti Sains Malaysia.
spellingShingle TR925-1050 Photomechanical processes
Siow, Yuen Tien
Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_full Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_fullStr Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_full_unstemmed Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_short Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_sort cycle time analysis for photolithography tools in semiconductor manufacturing industry with simulation model a case study tr940 s618 2008 f rb
topic TR925-1050 Photomechanical processes
url http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf
work_keys_str_mv AT siowyuentien cycletimeanalysisforphotolithographytoolsinsemiconductormanufacturingindustrywithsimulationmodelacasestudytr940s6182008frb