Investigation on plasma properties for deposition of titanium nitride film using reactive magnetron sputtering system
Deposition of thin film using plasma sputtering system had been widely discovered and developed extensively for many years in technological and industrial process especially formation of titanium nitride (TiN) films due to its high hardness, good wear resistance, low friction coeffcient and chemical...
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| Format: | Thesis |
| Language: | English English English |
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2018
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| Online Access: | http://eprints.uthm.edu.my/245/1/24p%20SOO%20REH%20HOW.pdf http://eprints.uthm.edu.my/245/2/SOO%20REH%20HOW%20COPYRIGHT%20DECLARATION.pdf http://eprints.uthm.edu.my/245/3/SOO%20REH%20HOW%20WATERMARK.pdf |