Growth of TiO2 thin films by Atomic Layer Deposition (ALD)
Ceramic oxide thin films are an important material, with applications in many areas of science and technology. Titanium oxide (TiO2) is also a well-known and important material for applications such as gas sensors [1], photocatalysis materials [3], and electrochemicals [1], due to its self-cleaning...
Main Authors: | Hussin, Rosniza, Kwang, Leong Choy, Xiang, Hui Hou |
---|---|
Format: | Article |
Language: | English |
Published: |
Trans Tech Publications
2016
|
Subjects: | |
Online Access: | http://eprints.uthm.edu.my/5621/1/AJ%202016%20%28103%29.pdf |
Similar Items
-
Fabrication of nanorod TiO2/CU2O heterostructure thin film
by: Fahrizal, Fadilah Norazni
Published: (2019) -
Comparative study of nanorods and nanoflowers TiO2 thin film for heterostructure application
by: Razali, Fakhriah
Published: (2019) -
The effect of substrate on TiO2 thin films deposited by atomic layer
deposition (ALD)
by: Hussin, Rosniza, et al.
Published: (2015) -
Fabrication methods of organic thin film transistor for volatile organic compounds gas sensor
by: Morsin, Marlia, et al.
Published: (2019) -
Comparative study of infrared Nd:YAG pulsed laser radiation on Pt thin film
by: Bhari, Bibi Zulaika, et al.
Published: (2017)