Characterization of CrAg Bi-layer thin metal contacts sputter deposited on N-type si semiconductor
Good electrical conductivity of metal contacts on semiconductor are very crucial in determining quality of the energy conversion efficiency. This paper reports on the Cr/Ag thin metal contacts properties sputter deposited on n-type Si. The metal contacts were characterized based on the morphological...
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| Format: | Article |
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Science Publishing Corporation
2018
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| _version_ | 1825710100739784704 |
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| author | Ali, Ahmad Hadi Pauzi, Nurul Syafiqah |
| author_facet | Ali, Ahmad Hadi Pauzi, Nurul Syafiqah |
| author_sort | Ali, Ahmad Hadi |
| collection | UTHM |
| description | Good electrical conductivity of metal contacts on semiconductor are very crucial in determining quality of the energy conversion efficiency. This paper reports on the Cr/Ag thin metal contacts properties sputter deposited on n-type Si. The metal contacts were characterized based on the morphological and electrical properties. The surface morphology of metal contacts was characterized by using atomic force microscope (AFM) and resulted in increment of the surface roughness from 1.35 nm to 9.21 nm at the thickness of 20 nm to 100 nm. The electrical characteristics were characterized by using four-point probe system. From the measurement, the lowest electrical resistivity was measured as 1.19 × 10-6 -cm at Ag thickness of 100 nm. Whereas the electrical conductivity of the thin metal contact was obtained as 8.40 × 105 -cm-1 at Ag thickness of 100 nm. From the analysis, it is clearly shown that as the Ag thin metal thickness gets thicker, the surface roughness gets rougher thus resulting in the improvement of the electrical characteristics of the Si/Cr/Ag contacts |
| first_indexed | 2024-03-05T21:52:29Z |
| format | Article |
| id | uthm.eprints-5921 |
| institution | Universiti Tun Hussein Onn Malaysia |
| last_indexed | 2024-03-05T21:52:29Z |
| publishDate | 2018 |
| publisher | Science Publishing Corporation |
| record_format | dspace |
| spelling | uthm.eprints-59212022-01-25T00:25:46Z http://eprints.uthm.edu.my/5921/ Characterization of CrAg Bi-layer thin metal contacts sputter deposited on N-type si semiconductor Ali, Ahmad Hadi Pauzi, Nurul Syafiqah TP155-156 Chemical engineering Good electrical conductivity of metal contacts on semiconductor are very crucial in determining quality of the energy conversion efficiency. This paper reports on the Cr/Ag thin metal contacts properties sputter deposited on n-type Si. The metal contacts were characterized based on the morphological and electrical properties. The surface morphology of metal contacts was characterized by using atomic force microscope (AFM) and resulted in increment of the surface roughness from 1.35 nm to 9.21 nm at the thickness of 20 nm to 100 nm. The electrical characteristics were characterized by using four-point probe system. From the measurement, the lowest electrical resistivity was measured as 1.19 × 10-6 -cm at Ag thickness of 100 nm. Whereas the electrical conductivity of the thin metal contact was obtained as 8.40 × 105 -cm-1 at Ag thickness of 100 nm. From the analysis, it is clearly shown that as the Ag thin metal thickness gets thicker, the surface roughness gets rougher thus resulting in the improvement of the electrical characteristics of the Si/Cr/Ag contacts Science Publishing Corporation 2018 Article PeerReviewed Ali, Ahmad Hadi and Pauzi, Nurul Syafiqah (2018) Characterization of CrAg Bi-layer thin metal contacts sputter deposited on N-type si semiconductor. International Journal of Engineering & Technology, 7 (4.3). pp. 326-329. ISSN 2227-524X |
| spellingShingle | TP155-156 Chemical engineering Ali, Ahmad Hadi Pauzi, Nurul Syafiqah Characterization of CrAg Bi-layer thin metal contacts sputter deposited on N-type si semiconductor |
| title | Characterization of CrAg Bi-layer thin metal contacts sputter deposited on N-type si semiconductor |
| title_full | Characterization of CrAg Bi-layer thin metal contacts sputter deposited on N-type si semiconductor |
| title_fullStr | Characterization of CrAg Bi-layer thin metal contacts sputter deposited on N-type si semiconductor |
| title_full_unstemmed | Characterization of CrAg Bi-layer thin metal contacts sputter deposited on N-type si semiconductor |
| title_short | Characterization of CrAg Bi-layer thin metal contacts sputter deposited on N-type si semiconductor |
| title_sort | characterization of crag bi layer thin metal contacts sputter deposited on n type si semiconductor |
| topic | TP155-156 Chemical engineering |
| work_keys_str_mv | AT aliahmadhadi characterizationofcragbilayerthinmetalcontactssputterdepositedonntypesisemiconductor AT pauzinurulsyafiqah characterizationofcragbilayerthinmetalcontactssputterdepositedonntypesisemiconductor |