Difference in structural and chemical properties of sol-gel spn coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopants
n this research, pure titanium dioxide (TiO2) and doped TiO2 thin film layers were prepared using the spin coating method of titanium(IV) butoxide on a glass substrate from the sol–gel method and annealed at 500 °C. The effects on the structural and chemical properties of these thin films were then...
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The Royal Society of Chemistry
2018
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| author | Mohd Said, Nor Damsyik Sahdan, Mohd Zainizan Nayan, Nafarizal Saim, Hashim Adriyanto, Feri Bakri, Anis Suhaili Morsin, Marlia |
| author_facet | Mohd Said, Nor Damsyik Sahdan, Mohd Zainizan Nayan, Nafarizal Saim, Hashim Adriyanto, Feri Bakri, Anis Suhaili Morsin, Marlia |
| author_sort | Mohd Said, Nor Damsyik |
| collection | UTHM |
| description | n this research, pure titanium dioxide (TiO2) and doped TiO2 thin film layers were prepared using the spin coating method of titanium(IV) butoxide on a glass substrate from the sol–gel method and annealed at 500 °C. The effects on the structural and chemical properties of these thin films were then investigated. The metal doped TiO2 thin film which exists as trivalent electrons consists of aluminium (Al), yttrium (Y) and gadolinium (Gd). The anatase phase of the thin films was observed and it was found that the crystal size became smaller when the concentration of thin film increased. The grain size was found to be 0.487 to 13.925 nm. The types of surface morphologies of the thin films were nanoporous, with a little agglomeration and smaller nanoparticles corresponding to Al doped TiO2, Y doped TiO2 and Gd doped TiO2, respectively. The trivalent doping concentration of the thin films increased with a rising of thickness of the thin film. This can contribute to the defects that give advantages to the thin film when the mobility of the hole carriers is high and the electrons of Ti can move easily. Thus, Ti3+ existed as a defect state in the metal doped TiO2 thin film based on lattice distortion with a faster growth thin film that encouraged the formation of a higher level of oxygen vacancy defects. |
| first_indexed | 2024-03-05T21:52:37Z |
| format | Article |
| id | uthm.eprints-5986 |
| institution | Universiti Tun Hussein Onn Malaysia |
| last_indexed | 2024-03-05T21:52:37Z |
| publishDate | 2018 |
| publisher | The Royal Society of Chemistry |
| record_format | dspace |
| spelling | uthm.eprints-59862022-01-25T07:22:41Z http://eprints.uthm.edu.my/5986/ Difference in structural and chemical properties of sol-gel spn coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopants Mohd Said, Nor Damsyik Sahdan, Mohd Zainizan Nayan, Nafarizal Saim, Hashim Adriyanto, Feri Bakri, Anis Suhaili Morsin, Marlia TP155-156 Chemical engineering n this research, pure titanium dioxide (TiO2) and doped TiO2 thin film layers were prepared using the spin coating method of titanium(IV) butoxide on a glass substrate from the sol–gel method and annealed at 500 °C. The effects on the structural and chemical properties of these thin films were then investigated. The metal doped TiO2 thin film which exists as trivalent electrons consists of aluminium (Al), yttrium (Y) and gadolinium (Gd). The anatase phase of the thin films was observed and it was found that the crystal size became smaller when the concentration of thin film increased. The grain size was found to be 0.487 to 13.925 nm. The types of surface morphologies of the thin films were nanoporous, with a little agglomeration and smaller nanoparticles corresponding to Al doped TiO2, Y doped TiO2 and Gd doped TiO2, respectively. The trivalent doping concentration of the thin films increased with a rising of thickness of the thin film. This can contribute to the defects that give advantages to the thin film when the mobility of the hole carriers is high and the electrons of Ti can move easily. Thus, Ti3+ existed as a defect state in the metal doped TiO2 thin film based on lattice distortion with a faster growth thin film that encouraged the formation of a higher level of oxygen vacancy defects. The Royal Society of Chemistry 2018 Article PeerReviewed Mohd Said, Nor Damsyik and Sahdan, Mohd Zainizan and Nayan, Nafarizal and Saim, Hashim and Adriyanto, Feri and Bakri, Anis Suhaili and Morsin, Marlia (2018) Difference in structural and chemical properties of sol-gel spn coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopants. RSC Advances, 8 (52). pp. 29686-29697. ISSN 2046-2069 https://dx.doi.org/10.1039/c8ra03950j |
| spellingShingle | TP155-156 Chemical engineering Mohd Said, Nor Damsyik Sahdan, Mohd Zainizan Nayan, Nafarizal Saim, Hashim Adriyanto, Feri Bakri, Anis Suhaili Morsin, Marlia Difference in structural and chemical properties of sol-gel spn coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopants |
| title | Difference in structural and chemical properties of sol-gel spn coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopants |
| title_full | Difference in structural and chemical properties of sol-gel spn coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopants |
| title_fullStr | Difference in structural and chemical properties of sol-gel spn coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopants |
| title_full_unstemmed | Difference in structural and chemical properties of sol-gel spn coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopants |
| title_short | Difference in structural and chemical properties of sol-gel spn coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopants |
| title_sort | difference in structural and chemical properties of sol gel spn coated al doped tio2 y doped tio2 and gd doped tio2 based on trivalent dopants |
| topic | TP155-156 Chemical engineering |
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