An investigation of physical processes in nanosphere lithography
Various physical processes have been investigated in order to improve the Nanosphere Lithography (NSL) technique by modifying the nanosphere structures. Polysytrene CPS) nanospheres used in NSL can be modified in three schemes: Electron beam, heat and chemical manipulation techniques. The most...
| Autor principal: | |
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| Formato: | Tese |
| Idioma: | English |
| Publicado em: |
2006
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| Assuntos: | |
| Acesso em linha: | http://eprints.uthm.edu.my/7348/1/24p%20MOHD%20ARIF%20AGAM.pdf |
| _version_ | 1825710362788364288 |
|---|---|
| author | Agam, Mohd Arif |
| author_facet | Agam, Mohd Arif |
| author_sort | Agam, Mohd Arif |
| collection | UTHM |
| description | Various physical processes have been investigated in order to improve the
Nanosphere Lithography (NSL) technique by modifying the nanosphere structures.
Polysytrene CPS) nanospheres used in NSL can be modified in three schemes:
Electron beam, heat and chemical manipulation techniques. The most successful
scheme to modify nanosphere structures is by the electron beam manipulation
technique. Using electron beam irradiation, both the size and shape of the nanospheres
can be modified in a controlled manner. An ordered array of spheres can be modified
by electron beam irradiation to create a pattern otherwise not available through self�assembly alone. Mechanisms of polymer degradation induced by energetic electrons
are discussed.
Heat and chemical manipulation techniques have created freestanding
transportable nanospheres thin films (FTNFs) that can be further processed with
reactive ion etching (RIE) to create a freestanding transportable lithography mask. A
unique honeycomb structure has been created when PS nanospheres were treated with
organic solvents. The formation of the honeycomb structure depends on the
concentration of the organic solvents and the nanosphere dissolution rate when in
contact with organic solvents. |
| first_indexed | 2024-03-05T21:56:27Z |
| format | Thesis |
| id | uthm.eprints-7348 |
| institution | Universiti Tun Hussein Onn Malaysia |
| language | English |
| last_indexed | 2024-03-05T21:56:27Z |
| publishDate | 2006 |
| record_format | dspace |
| spelling | uthm.eprints-73482022-07-21T04:10:06Z http://eprints.uthm.edu.my/7348/ An investigation of physical processes in nanosphere lithography Agam, Mohd Arif TA Engineering (General). Civil engineering (General) TA401-492 Materials of engineering and construction. Mechanics of materials Various physical processes have been investigated in order to improve the Nanosphere Lithography (NSL) technique by modifying the nanosphere structures. Polysytrene CPS) nanospheres used in NSL can be modified in three schemes: Electron beam, heat and chemical manipulation techniques. The most successful scheme to modify nanosphere structures is by the electron beam manipulation technique. Using electron beam irradiation, both the size and shape of the nanospheres can be modified in a controlled manner. An ordered array of spheres can be modified by electron beam irradiation to create a pattern otherwise not available through self�assembly alone. Mechanisms of polymer degradation induced by energetic electrons are discussed. Heat and chemical manipulation techniques have created freestanding transportable nanospheres thin films (FTNFs) that can be further processed with reactive ion etching (RIE) to create a freestanding transportable lithography mask. A unique honeycomb structure has been created when PS nanospheres were treated with organic solvents. The formation of the honeycomb structure depends on the concentration of the organic solvents and the nanosphere dissolution rate when in contact with organic solvents. 2006-08 Thesis NonPeerReviewed text en http://eprints.uthm.edu.my/7348/1/24p%20MOHD%20ARIF%20AGAM.pdf Agam, Mohd Arif (2006) An investigation of physical processes in nanosphere lithography. Doctoral thesis, University of Birmingham. |
| spellingShingle | TA Engineering (General). Civil engineering (General) TA401-492 Materials of engineering and construction. Mechanics of materials Agam, Mohd Arif An investigation of physical processes in nanosphere lithography |
| title | An investigation of physical processes in nanosphere lithography |
| title_full | An investigation of physical processes in nanosphere lithography |
| title_fullStr | An investigation of physical processes in nanosphere lithography |
| title_full_unstemmed | An investigation of physical processes in nanosphere lithography |
| title_short | An investigation of physical processes in nanosphere lithography |
| title_sort | investigation of physical processes in nanosphere lithography |
| topic | TA Engineering (General). Civil engineering (General) TA401-492 Materials of engineering and construction. Mechanics of materials |
| url | http://eprints.uthm.edu.my/7348/1/24p%20MOHD%20ARIF%20AGAM.pdf |
| work_keys_str_mv | AT agammohdarif aninvestigationofphysicalprocessesinnanospherelithography AT agammohdarif investigationofphysicalprocessesinnanospherelithography |