An investigation of physical processes in nanosphere lithography

Various physical processes have been investigated in order to improve the Nanosphere Lithography (NSL) technique by modifying the nanosphere structures. Polysytrene CPS) nanospheres used in NSL can be modified in three schemes: Electron beam, heat and chemical manipulation techniques. The most...

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Main Author: Agam, Mohd Arif
Format: Thesis
Language:English
Published: 2006
Subjects:
Online Access:http://eprints.uthm.edu.my/7348/1/24p%20MOHD%20ARIF%20AGAM.pdf
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author Agam, Mohd Arif
author_facet Agam, Mohd Arif
author_sort Agam, Mohd Arif
collection UTHM
description Various physical processes have been investigated in order to improve the Nanosphere Lithography (NSL) technique by modifying the nanosphere structures. Polysytrene CPS) nanospheres used in NSL can be modified in three schemes: Electron beam, heat and chemical manipulation techniques. The most successful scheme to modify nanosphere structures is by the electron beam manipulation technique. Using electron beam irradiation, both the size and shape of the nanospheres can be modified in a controlled manner. An ordered array of spheres can be modified by electron beam irradiation to create a pattern otherwise not available through self�assembly alone. Mechanisms of polymer degradation induced by energetic electrons are discussed. Heat and chemical manipulation techniques have created freestanding transportable nanospheres thin films (FTNFs) that can be further processed with reactive ion etching (RIE) to create a freestanding transportable lithography mask. A unique honeycomb structure has been created when PS nanospheres were treated with organic solvents. The formation of the honeycomb structure depends on the concentration of the organic solvents and the nanosphere dissolution rate when in contact with organic solvents.
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spelling uthm.eprints-73482022-07-21T04:10:06Z http://eprints.uthm.edu.my/7348/ An investigation of physical processes in nanosphere lithography Agam, Mohd Arif TA Engineering (General). Civil engineering (General) TA401-492 Materials of engineering and construction. Mechanics of materials Various physical processes have been investigated in order to improve the Nanosphere Lithography (NSL) technique by modifying the nanosphere structures. Polysytrene CPS) nanospheres used in NSL can be modified in three schemes: Electron beam, heat and chemical manipulation techniques. The most successful scheme to modify nanosphere structures is by the electron beam manipulation technique. Using electron beam irradiation, both the size and shape of the nanospheres can be modified in a controlled manner. An ordered array of spheres can be modified by electron beam irradiation to create a pattern otherwise not available through self�assembly alone. Mechanisms of polymer degradation induced by energetic electrons are discussed. Heat and chemical manipulation techniques have created freestanding transportable nanospheres thin films (FTNFs) that can be further processed with reactive ion etching (RIE) to create a freestanding transportable lithography mask. A unique honeycomb structure has been created when PS nanospheres were treated with organic solvents. The formation of the honeycomb structure depends on the concentration of the organic solvents and the nanosphere dissolution rate when in contact with organic solvents. 2006-08 Thesis NonPeerReviewed text en http://eprints.uthm.edu.my/7348/1/24p%20MOHD%20ARIF%20AGAM.pdf Agam, Mohd Arif (2006) An investigation of physical processes in nanosphere lithography. Doctoral thesis, University of Birmingham.
spellingShingle TA Engineering (General). Civil engineering (General)
TA401-492 Materials of engineering and construction. Mechanics of materials
Agam, Mohd Arif
An investigation of physical processes in nanosphere lithography
title An investigation of physical processes in nanosphere lithography
title_full An investigation of physical processes in nanosphere lithography
title_fullStr An investigation of physical processes in nanosphere lithography
title_full_unstemmed An investigation of physical processes in nanosphere lithography
title_short An investigation of physical processes in nanosphere lithography
title_sort investigation of physical processes in nanosphere lithography
topic TA Engineering (General). Civil engineering (General)
TA401-492 Materials of engineering and construction. Mechanics of materials
url http://eprints.uthm.edu.my/7348/1/24p%20MOHD%20ARIF%20AGAM.pdf
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