Optical properties measurements of nanocrystalline silicon thin films

Optical properties measurements of nanocrystalline silicon thin films

Nanocrystalline silicon (nc-Si) thin films on 7059 corning glass substrate were prepared using Very High Frequency Plasma-Enhanced Chemical Vapour Deposition (VHF-PECVD) at different deposition temperatures. The nc-Si properties film were analyzed using spectroscopic ellipsometer, ultra violet (UV-V...

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Bibliographic Details
Main Author:	Gan, Chee Hong
Format:	Thesis
Language:	English
Published:	2011
Subjects:	Q Science (General)
Online Access:	http://eprints.utm.my/33381/1/GanCheeHongMFS2011.pdf

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