Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films

Cathodic arc physical vapor deposition (CAPVD) a technique used for the deposition of hard coatings for tooling applications has many advantages. The main drawback of this technique is the formation of macrodroplets (MDs) during deposition resulting in films with rougher morphology. The MDs contamin...

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Main Authors: Ali, M., Hamzah, E., Abbas, T., Mohd Toff, M.R.H., Qazi, I.A.
Format: Article
Published: World Scientific Publishing Co 2008
Subjects:
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author Ali, M.
Hamzah, E.
Abbas, T.
Mohd Toff, M.R.H.
Qazi, I.A.
author_facet Ali, M.
Hamzah, E.
Abbas, T.
Mohd Toff, M.R.H.
Qazi, I.A.
author_sort Ali, M.
collection ePrints
description Cathodic arc physical vapor deposition (CAPVD) a technique used for the deposition of hard coatings for tooling applications has many advantages. The main drawback of this technique is the formation of macrodroplets (MDs) during deposition resulting in films with rougher morphology. The MDs contamination and growth mechanisms was investigated in TiN coatings over high-speed steel, as a function of metal ion etching, substrate bias, and nitrogen gas flow rate; it was observed that the latter is the most important factor in controlling the size and number of the macrodroplets. © 2008 World Scientific Publishing Company.
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spelling utm.eprints-70212017-10-22T06:51:57Z http://eprints.utm.my/7021/ Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films Ali, M. Hamzah, E. Abbas, T. Mohd Toff, M.R.H. Qazi, I.A. TJ Mechanical engineering and machinery Cathodic arc physical vapor deposition (CAPVD) a technique used for the deposition of hard coatings for tooling applications has many advantages. The main drawback of this technique is the formation of macrodroplets (MDs) during deposition resulting in films with rougher morphology. The MDs contamination and growth mechanisms was investigated in TiN coatings over high-speed steel, as a function of metal ion etching, substrate bias, and nitrogen gas flow rate; it was observed that the latter is the most important factor in controlling the size and number of the macrodroplets. © 2008 World Scientific Publishing Company. World Scientific Publishing Co 2008-10 Article PeerReviewed Ali, M. and Hamzah, E. and Abbas, T. and Mohd Toff, M.R.H. and Qazi, I.A. (2008) Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films. Surface Review and Letters , 15 (5). pp. 653-659. ISSN 0218625X http://doi.dx.org/10.1142/S0218625X08011810
spellingShingle TJ Mechanical engineering and machinery
Ali, M.
Hamzah, E.
Abbas, T.
Mohd Toff, M.R.H.
Qazi, I.A.
Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films
title Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films
title_full Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films
title_fullStr Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films
title_full_unstemmed Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films
title_short Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films
title_sort macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of tin films
topic TJ Mechanical engineering and machinery
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AT abbast macrodropletreductionandgrowthmechanismsincathodicarcphysicalvapordepositionoftinfilms
AT mohdtoffmrh macrodropletreductionandgrowthmechanismsincathodicarcphysicalvapordepositionoftinfilms
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