Controlling of deposition time as an effective parameter on purified growth CNTs based on TCVD method

According to the unique properties of Carbon nanotubes (CNTs), they have been under scientific investigation for more than fifteen years in different applications. Here we reported the effect of temperature on camphor in a wide range of 500-1150 C. The results indicate that camphor did not decompose...

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Main Authors: Yousefi, A. T., Mahmood, M. R., Ikeda, S.
Format: Conference or Workshop Item
Published: American Institute of Physics Inc. 2016
Subjects:
_version_ 1796862034234572800
author Yousefi, A. T.
Mahmood, M. R.
Ikeda, S.
author_facet Yousefi, A. T.
Mahmood, M. R.
Ikeda, S.
author_sort Yousefi, A. T.
collection ePrints
description According to the unique properties of Carbon nanotubes (CNTs), they have been under scientific investigation for more than fifteen years in different applications. Here we reported the effect of temperature on camphor in a wide range of 500-1150 C. The results indicate that camphor did not decompose below 500 C but very short-length tubes emerged from the silicon substrate at 550 C which is suggesting that the catalyst activity. According to the results, the CNT growth rate was abruptly increased at 600 C. This process was done on the same condition by optimizing the temperature up to 900 C. FESEM images indicate the highest catalyst activity at 850 C which direct the experiment to grow purified CNT up to 3 μm in the length. This result suggests that, at low temperatures, the catalyst-support interaction is strong enough not to let the metal particles to involve in deposition process, but at 850 C MWCNTs and SWCNTs can be selectively grown as a function of CVD temperature. The optimum deposition time was found in 30 minutes, which based on the Raman shift results the growth CNTs has shown high purity and crystallinity as well as high aspect ratio.
first_indexed 2024-03-05T20:05:27Z
format Conference or Workshop Item
id utm.eprints-73163
institution Universiti Teknologi Malaysia - ePrints
last_indexed 2024-03-05T20:05:27Z
publishDate 2016
publisher American Institute of Physics Inc.
record_format dspace
spelling utm.eprints-731632017-11-20T08:33:48Z http://eprints.utm.my/73163/ Controlling of deposition time as an effective parameter on purified growth CNTs based on TCVD method Yousefi, A. T. Mahmood, M. R. Ikeda, S. T Technology (General) According to the unique properties of Carbon nanotubes (CNTs), they have been under scientific investigation for more than fifteen years in different applications. Here we reported the effect of temperature on camphor in a wide range of 500-1150 C. The results indicate that camphor did not decompose below 500 C but very short-length tubes emerged from the silicon substrate at 550 C which is suggesting that the catalyst activity. According to the results, the CNT growth rate was abruptly increased at 600 C. This process was done on the same condition by optimizing the temperature up to 900 C. FESEM images indicate the highest catalyst activity at 850 C which direct the experiment to grow purified CNT up to 3 μm in the length. This result suggests that, at low temperatures, the catalyst-support interaction is strong enough not to let the metal particles to involve in deposition process, but at 850 C MWCNTs and SWCNTs can be selectively grown as a function of CVD temperature. The optimum deposition time was found in 30 minutes, which based on the Raman shift results the growth CNTs has shown high purity and crystallinity as well as high aspect ratio. American Institute of Physics Inc. 2016 Conference or Workshop Item PeerReviewed Yousefi, A. T. and Mahmood, M. R. and Ikeda, S. (2016) Controlling of deposition time as an effective parameter on purified growth CNTs based on TCVD method. In: International Conference on Nano-Electronic Technology Devices and Materials 2015, IC-NET 2015, 27 February 2015 through 2 March 2015, Selangor; Malaysia. https://www.scopus.com/inward/record.uri?eid=2-s2.0-84984537574&doi=10.1063%2f1.4948857&partnerID=40&md5=161436ff71833132f5c1a6c2de42bf5b
spellingShingle T Technology (General)
Yousefi, A. T.
Mahmood, M. R.
Ikeda, S.
Controlling of deposition time as an effective parameter on purified growth CNTs based on TCVD method
title Controlling of deposition time as an effective parameter on purified growth CNTs based on TCVD method
title_full Controlling of deposition time as an effective parameter on purified growth CNTs based on TCVD method
title_fullStr Controlling of deposition time as an effective parameter on purified growth CNTs based on TCVD method
title_full_unstemmed Controlling of deposition time as an effective parameter on purified growth CNTs based on TCVD method
title_short Controlling of deposition time as an effective parameter on purified growth CNTs based on TCVD method
title_sort controlling of deposition time as an effective parameter on purified growth cnts based on tcvd method
topic T Technology (General)
work_keys_str_mv AT yousefiat controllingofdepositiontimeasaneffectiveparameteronpurifiedgrowthcntsbasedontcvdmethod
AT mahmoodmr controllingofdepositiontimeasaneffectiveparameteronpurifiedgrowthcntsbasedontcvdmethod
AT ikedas controllingofdepositiontimeasaneffectiveparameteronpurifiedgrowthcntsbasedontcvdmethod