Development of Defect-Free Asymmetric Polysulfone Membranes for gas separation using response surface methodology

This paper reports the preparation of defect-free asymmetric membranes through the manipulation of membrane fabrication variables, including polymer concentration, solvent ratio (ratio of less volatile solvent to more volatile solvent), forced-convective evaporation time and casting shear rate. Main...

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Main Authors: Ismail, Ahmad Fauzi, Lai, P. Y.
Format: Article
Published: Elsevier 2004
Subjects:
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author Ismail, Ahmad Fauzi
Lai, P. Y.
author_facet Ismail, Ahmad Fauzi
Lai, P. Y.
author_sort Ismail, Ahmad Fauzi
collection ePrints
description This paper reports the preparation of defect-free asymmetric membranes through the manipulation of membrane fabrication variables, including polymer concentration, solvent ratio (ratio of less volatile solvent to more volatile solvent), forced-convective evaporation time and casting shear rate. Main effects and interaction effects of these variables on membrane structure and performance were investigated by using factorial design and response surface methodology in order to optimize membrane formation process. According to the results of this study, an essentially defect-free skin layer with skin thickness in the range of 6590–11330Å was prepared for asymmetric polysulfone membranes. Selectivity of these membranes was relatively higher as compared to conventional membranes; some of them even surpassed the intrinsic selectivity. Therefore, optimal processing conditions can be developed to prepare defect-free asymmetric membranes for gas separation.
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spelling utm.eprints-7912017-05-17T06:38:29Z http://eprints.utm.my/791/ Development of Defect-Free Asymmetric Polysulfone Membranes for gas separation using response surface methodology Ismail, Ahmad Fauzi Lai, P. Y. TP Chemical technology This paper reports the preparation of defect-free asymmetric membranes through the manipulation of membrane fabrication variables, including polymer concentration, solvent ratio (ratio of less volatile solvent to more volatile solvent), forced-convective evaporation time and casting shear rate. Main effects and interaction effects of these variables on membrane structure and performance were investigated by using factorial design and response surface methodology in order to optimize membrane formation process. According to the results of this study, an essentially defect-free skin layer with skin thickness in the range of 6590–11330Å was prepared for asymmetric polysulfone membranes. Selectivity of these membranes was relatively higher as compared to conventional membranes; some of them even surpassed the intrinsic selectivity. Therefore, optimal processing conditions can be developed to prepare defect-free asymmetric membranes for gas separation. Elsevier 2004-12 Article PeerReviewed Ismail, Ahmad Fauzi and Lai, P. Y. (2004) Development of Defect-Free Asymmetric Polysulfone Membranes for gas separation using response surface methodology. Separation and Purification Technology, 40 (2). pp. 191-207. ISSN 1383-5866 http://dx.doi.org/10.1016/j.seppur.2004.02.011 doi:10.1016/j.seppur.2004.02.011
spellingShingle TP Chemical technology
Ismail, Ahmad Fauzi
Lai, P. Y.
Development of Defect-Free Asymmetric Polysulfone Membranes for gas separation using response surface methodology
title Development of Defect-Free Asymmetric Polysulfone Membranes for gas separation using response surface methodology
title_full Development of Defect-Free Asymmetric Polysulfone Membranes for gas separation using response surface methodology
title_fullStr Development of Defect-Free Asymmetric Polysulfone Membranes for gas separation using response surface methodology
title_full_unstemmed Development of Defect-Free Asymmetric Polysulfone Membranes for gas separation using response surface methodology
title_short Development of Defect-Free Asymmetric Polysulfone Membranes for gas separation using response surface methodology
title_sort development of defect free asymmetric polysulfone membranes for gas separation using response surface methodology
topic TP Chemical technology
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