Modelling of nanoscale MOSFET performance in the velocity saturation region

Velocity saturation as a function of temperature and drain voltage for n-channel MOSFET is investigated. The combination of an existing current-voltage (I-V) model, drain source resistance model and a more precise mobility derivation gives an accurate representation of velocity saturation as a funct...

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Main Authors: Tan, Micheal Loong Peng, Ismail, Razali
Format: Article
Language:English
English
Published: Faculty of Electrical Engineering 2007
Subjects:
Online Access:http://eprints.utm.my/8071/1/RazaliIsmail2007_ModelingofNanoscaleMOSFETPerformance.pdf
http://eprints.utm.my/8071/3/paper7june07_michael_tan.pdf
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author Tan, Micheal Loong Peng
Ismail, Razali
author_facet Tan, Micheal Loong Peng
Ismail, Razali
author_sort Tan, Micheal Loong Peng
collection ePrints
description Velocity saturation as a function of temperature and drain voltage for n-channel MOSFET is investigated. The combination of an existing current-voltage (I-V) model, drain source resistance model and a more precise mobility derivation gives an accurate representation of velocity saturation as a function of the above parameters. A simplified threshold voltage formulation is developed to provide similar accuracy when compared to actual devices. The models show good agreement with the experimental data over a wide range of gate and drain bias for 90nm process technology.
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spelling utm.eprints-80712013-12-02T07:56:13Z http://eprints.utm.my/8071/ Modelling of nanoscale MOSFET performance in the velocity saturation region Tan, Micheal Loong Peng Ismail, Razali TK Electrical engineering. Electronics Nuclear engineering Velocity saturation as a function of temperature and drain voltage for n-channel MOSFET is investigated. The combination of an existing current-voltage (I-V) model, drain source resistance model and a more precise mobility derivation gives an accurate representation of velocity saturation as a function of the above parameters. A simplified threshold voltage formulation is developed to provide similar accuracy when compared to actual devices. The models show good agreement with the experimental data over a wide range of gate and drain bias for 90nm process technology. Faculty of Electrical Engineering 2007 Article PeerReviewed application/pdf en http://eprints.utm.my/8071/1/RazaliIsmail2007_ModelingofNanoscaleMOSFETPerformance.pdf text/html en http://eprints.utm.my/8071/3/paper7june07_michael_tan.pdf Tan, Micheal Loong Peng and Ismail, Razali (2007) Modelling of nanoscale MOSFET performance in the velocity saturation region. Elektrika, 9 (1). pp. 37-41. ISSN 0128-4428
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Tan, Micheal Loong Peng
Ismail, Razali
Modelling of nanoscale MOSFET performance in the velocity saturation region
title Modelling of nanoscale MOSFET performance in the velocity saturation region
title_full Modelling of nanoscale MOSFET performance in the velocity saturation region
title_fullStr Modelling of nanoscale MOSFET performance in the velocity saturation region
title_full_unstemmed Modelling of nanoscale MOSFET performance in the velocity saturation region
title_short Modelling of nanoscale MOSFET performance in the velocity saturation region
title_sort modelling of nanoscale mosfet performance in the velocity saturation region
topic TK Electrical engineering. Electronics Nuclear engineering
url http://eprints.utm.my/8071/1/RazaliIsmail2007_ModelingofNanoscaleMOSFETPerformance.pdf
http://eprints.utm.my/8071/3/paper7june07_michael_tan.pdf
work_keys_str_mv AT tanmichealloongpeng modellingofnanoscalemosfetperformanceinthevelocitysaturationregion
AT ismailrazali modellingofnanoscalemosfetperformanceinthevelocitysaturationregion