Modelling of nanoscale MOSFET performance in the velocity saturation region
Velocity saturation as a function of temperature and drain voltage for n-channel MOSFET is investigated. The combination of an existing current-voltage (I-V) model, drain source resistance model and a more precise mobility derivation gives an accurate representation of velocity saturation as a funct...
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Format: | Article |
Language: | English English |
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Faculty of Electrical Engineering
2007
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Online Access: | http://eprints.utm.my/8071/1/RazaliIsmail2007_ModelingofNanoscaleMOSFETPerformance.pdf http://eprints.utm.my/8071/3/paper7june07_michael_tan.pdf |
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author | Tan, Micheal Loong Peng Ismail, Razali |
author_facet | Tan, Micheal Loong Peng Ismail, Razali |
author_sort | Tan, Micheal Loong Peng |
collection | ePrints |
description | Velocity saturation as a function of temperature and drain voltage for n-channel MOSFET is investigated. The combination of an existing current-voltage (I-V) model, drain source resistance model and a more precise mobility derivation gives an accurate representation of velocity saturation as a function of the above parameters. A simplified threshold voltage formulation is developed to provide similar accuracy when compared to actual devices. The models show good agreement with the experimental data over a wide range of gate and drain bias for 90nm process technology. |
first_indexed | 2024-03-05T18:12:39Z |
format | Article |
id | utm.eprints-8071 |
institution | Universiti Teknologi Malaysia - ePrints |
language | English English |
last_indexed | 2024-03-05T18:12:39Z |
publishDate | 2007 |
publisher | Faculty of Electrical Engineering |
record_format | dspace |
spelling | utm.eprints-80712013-12-02T07:56:13Z http://eprints.utm.my/8071/ Modelling of nanoscale MOSFET performance in the velocity saturation region Tan, Micheal Loong Peng Ismail, Razali TK Electrical engineering. Electronics Nuclear engineering Velocity saturation as a function of temperature and drain voltage for n-channel MOSFET is investigated. The combination of an existing current-voltage (I-V) model, drain source resistance model and a more precise mobility derivation gives an accurate representation of velocity saturation as a function of the above parameters. A simplified threshold voltage formulation is developed to provide similar accuracy when compared to actual devices. The models show good agreement with the experimental data over a wide range of gate and drain bias for 90nm process technology. Faculty of Electrical Engineering 2007 Article PeerReviewed application/pdf en http://eprints.utm.my/8071/1/RazaliIsmail2007_ModelingofNanoscaleMOSFETPerformance.pdf text/html en http://eprints.utm.my/8071/3/paper7june07_michael_tan.pdf Tan, Micheal Loong Peng and Ismail, Razali (2007) Modelling of nanoscale MOSFET performance in the velocity saturation region. Elektrika, 9 (1). pp. 37-41. ISSN 0128-4428 |
spellingShingle | TK Electrical engineering. Electronics Nuclear engineering Tan, Micheal Loong Peng Ismail, Razali Modelling of nanoscale MOSFET performance in the velocity saturation region |
title | Modelling of nanoscale MOSFET performance in the velocity saturation region
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title_full | Modelling of nanoscale MOSFET performance in the velocity saturation region
|
title_fullStr | Modelling of nanoscale MOSFET performance in the velocity saturation region
|
title_full_unstemmed | Modelling of nanoscale MOSFET performance in the velocity saturation region
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title_short | Modelling of nanoscale MOSFET performance in the velocity saturation region
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title_sort | modelling of nanoscale mosfet performance in the velocity saturation region |
topic | TK Electrical engineering. Electronics Nuclear engineering |
url | http://eprints.utm.my/8071/1/RazaliIsmail2007_ModelingofNanoscaleMOSFETPerformance.pdf http://eprints.utm.my/8071/3/paper7june07_michael_tan.pdf |
work_keys_str_mv | AT tanmichealloongpeng modellingofnanoscalemosfetperformanceinthevelocitysaturationregion AT ismailrazali modellingofnanoscalemosfetperformanceinthevelocitysaturationregion |