Modelling of nanoscale MOSFET performance in the velocity saturation region
Velocity saturation as a function of temperature and drain voltage for n-channel MOSFET is investigated. The combination of an existing current-voltage (I-V) model, drain source resistance model and a more precise mobility derivation gives an accurate representation of velocity saturation as a funct...
Main Authors: | Tan, Micheal Loong Peng, Ismail, Razali |
---|---|
Format: | Article |
Language: | English English |
Published: |
Faculty of Electrical Engineering
2007
|
Subjects: | |
Online Access: | http://eprints.utm.my/8071/1/RazaliIsmail2007_ModelingofNanoscaleMOSFETPerformance.pdf http://eprints.utm.my/8071/3/paper7june07_michael_tan.pdf |
Similar Items
-
Modeling the effect of velocity saturation in nanoscale MOSFET
by: Tan, Michael Loong Peng
Published: (2006) -
Investigation on the effects of halo implants for nanoscale vertical MOSFET
by: Ismail, Razali, et al.
Published: (2007) -
Design and simulation analysis of nanoscale vertical MOSFET technology
by: Saad, Ismail, et al.
Published: (2009) -
Ballistic mobility and saturation velocity in low-dimensional nanostructures
by: Saad, Ismail, et al.
Published: (2009) -
Device design consideration for nanoscale MOSFET using semiconductor TCAD tools
by: Teoh, Chin Hong, et al.
Published: (2006)