Thermal oxidation improvement in semiconductor wafer fabrication
Thermal oxidation is a process done to grow a layer of oxide on the surface of a silicon wafer at elevated temperatures to form silicon dioxide. Usually, it en-counters instability in oxide growth and results in variation in the oxide thickness formed. This leads to downtime of furnace and wafer scr...
Main Authors: | Mahandran, C. J., Fatah, A. Y. A., Bani, N. A., Kaidi, H. M., Muhtazaruddin, M. N,., Amran, N. B. |
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Format: | Article |
Published: |
Institute of Advanced Engineering and Science
2019
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Subjects: |
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