Interface damage of protective layer in TEM lamella preparation for highly doped ge substrate
This work reports on the TEM sample preparation of highly doped germanium (Ge) sample using focused ion beam (FIB) technique. The method of the deposition of protective layer is varied to observe the damage at the interface of protective layer and specimen surface. It is shown that TEM lamella prepa...
| Main Authors: | , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2019
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| Subjects: | |
| Online Access: | http://eprints.utm.my/88968/1/NurNadhirahMohamad2019_InterfaceDamageofProtectiveLayer.pdf |
| _version_ | 1796864735346425856 |
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| author | Mohamad Rashid, N. N. Ahmad Junaidi, N. H. Rahmah Aid, S. |
| author_facet | Mohamad Rashid, N. N. Ahmad Junaidi, N. H. Rahmah Aid, S. |
| author_sort | Mohamad Rashid, N. N. |
| collection | ePrints |
| description | This work reports on the TEM sample preparation of highly doped germanium (Ge) sample using focused ion beam (FIB) technique. The method of the deposition of protective layer is varied to observe the damage at the interface of protective layer and specimen surface. It is shown that TEM lamella prepared using the FIB inevitably contains the surface damage induced by the deposition of protective layer. An effective method of controlling the damage at the interface of protective layer and specimen surface is by introducing a two-step deposition technique of protective layer using electron beam and ion beam, with smooth interface can be observed when the imaging was performed for the cross-sectional TEM. |
| first_indexed | 2024-03-05T20:46:18Z |
| format | Conference or Workshop Item |
| id | utm.eprints-88968 |
| institution | Universiti Teknologi Malaysia - ePrints |
| language | English |
| last_indexed | 2024-03-05T20:46:18Z |
| publishDate | 2019 |
| record_format | dspace |
| spelling | utm.eprints-889682021-01-26T08:36:15Z http://eprints.utm.my/88968/ Interface damage of protective layer in TEM lamella preparation for highly doped ge substrate Mohamad Rashid, N. N. Ahmad Junaidi, N. H. Rahmah Aid, S. T Technology (General) This work reports on the TEM sample preparation of highly doped germanium (Ge) sample using focused ion beam (FIB) technique. The method of the deposition of protective layer is varied to observe the damage at the interface of protective layer and specimen surface. It is shown that TEM lamella prepared using the FIB inevitably contains the surface damage induced by the deposition of protective layer. An effective method of controlling the damage at the interface of protective layer and specimen surface is by introducing a two-step deposition technique of protective layer using electron beam and ion beam, with smooth interface can be observed when the imaging was performed for the cross-sectional TEM. 2019 Conference or Workshop Item PeerReviewed application/pdf en http://eprints.utm.my/88968/1/NurNadhirahMohamad2019_InterfaceDamageofProtectiveLayer.pdf Mohamad Rashid, N. N. and Ahmad Junaidi, N. H. and Rahmah Aid, S. (2019) Interface damage of protective layer in TEM lamella preparation for highly doped ge substrate. In: 2018 4th International Conference on Smart Material Research, ICSMR 2018, 16-18 Nov 2018, Sydney, Australia. https://dx.doi.org/10.1088/1757-899X/522/1/012003 |
| spellingShingle | T Technology (General) Mohamad Rashid, N. N. Ahmad Junaidi, N. H. Rahmah Aid, S. Interface damage of protective layer in TEM lamella preparation for highly doped ge substrate |
| title | Interface damage of protective layer in TEM lamella preparation for highly doped ge substrate |
| title_full | Interface damage of protective layer in TEM lamella preparation for highly doped ge substrate |
| title_fullStr | Interface damage of protective layer in TEM lamella preparation for highly doped ge substrate |
| title_full_unstemmed | Interface damage of protective layer in TEM lamella preparation for highly doped ge substrate |
| title_short | Interface damage of protective layer in TEM lamella preparation for highly doped ge substrate |
| title_sort | interface damage of protective layer in tem lamella preparation for highly doped ge substrate |
| topic | T Technology (General) |
| url | http://eprints.utm.my/88968/1/NurNadhirahMohamad2019_InterfaceDamageofProtectiveLayer.pdf |
| work_keys_str_mv | AT mohamadrashidnn interfacedamageofprotectivelayerintemlamellapreparationforhighlydopedgesubstrate AT ahmadjunaidinh interfacedamageofprotectivelayerintemlamellapreparationforhighlydopedgesubstrate AT rahmahaids interfacedamageofprotectivelayerintemlamellapreparationforhighlydopedgesubstrate |