Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
The deposition of diamond films on a silicon nitride (Si3N4) substrate is an attractive technique for industrial applications because of the excellent properties of diamond. Diamond possesses remarkable physical and mechanical properties such as chemical resistant, extreme hardness and highly wears...
Main Author: | Awang Sh'ri, Dayangku Noorfazidah |
---|---|
Format: | Thesis |
Language: | English |
Published: |
2009
|
Subjects: | |
Online Access: | http://eprints.utm.my/9997/1/DayangkuNoorfazidahAwangMFKM2009.pdf |
Similar Items
-
Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
by: Dayangku Noorfazidah, Awang Sh'ri
Published: (2009) -
Deposition and characterization of polycrystalline diamond coated on silicon nitride and tungsten carbide using microwave plasma assisted chemical vapour deposition technique
by: Agung Purniawan, Agung Purniawan
Published: (2008) -
Effect of substrate to filament distance on formation and photoluminescence properties of indium catalyzed silicon nanowires using hot-wire chemical vapor deposition
by: Chong, Su Kong, et al.
Published: (2013) -
Study on the role of filament temperature on growth of indium-catalyzed silicon nanowires by the hot-wire chemical vapor deposition technique
by: Chong, S.K., et al.
Published: (2012) -
Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD)
by: Chong, S.K., et al.
Published: (2011)