Multilayer block copolymer meshes by orthogonal self-assembly by Alexander-Katz, Alfredo, Ross, Caroline A., Berggren, Karl K., Tavakkoli Kermani Ghariehali, Amir, Nicaise, Sam, Gadelrab, Karim Raafat

“…Continued scaling-down of lithographic-pattern feature sizes has brought templated self-assembly of block copolymers (BCPs) into the forefront of nanofabrication research. …”
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Sacrificial-Post Templating Method for Block Copolymer Self-Assembly by Alexander-Katz, Alfredo, Ross, Caroline A., Berggren, Karl K., Tavakkoli Kermani Ghariehali, Amir, Nicaise, Sam, Hannon, Adam F., Gotrik, Kevin W.

“…A sacrificial-post templating method is presented for directing block copolymer self-assembly to form nanostructures consisting of monolayers and bilayers of microdomains. …”
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Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer by Hannon, Adam F., Gotrik, Kevin W., Alexander-Katz, Alfredo, Ross, Caroline A., Berggren, Karl K., Tavakkoli Kermani Ghariehali, Amir

“…Using an array of majority-block-functionalized posts makes it possible to locally control the self-assembly of a block copolymer and achieve several morphologies on a single substrate. …”
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Templated self-assembly of Si-containing block copolymers for nanoscale device fabrication by Ross, Caroline A., Manners, I., Gwyther, J., Jung, Yeon Sik, Chuang, Vivian Peng-Wei, Son, Jeong Gon, Gotrik, Kevin W., Mickiewicz, R. A., Yang, Joel K. W., Chang, J. B., Berggren, Karl K.

“…Block copolymers have been proposed for self-assembled nanolithography because they can spontaneously form well-ordered nanoscale periodic patterns of lines or dots in a rapid, low-cost process. …”
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Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays by Chang, Jae-Byum, Son, Jeong Gon, Hannon, Adam F., Alexander-Katz, Alfredo, Ross, Caroline A., Berggren, Karl K.

“…Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. …”
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Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films by Gotrik, Kevin W., Tavakkoli Kermani Ghariehali, Amir, Hannon, Adam F., Alexander-Katz, Alfredo, Ross, Caroline A., Berggren, Karl K.

“…The registration and alignment of a monolayer of microdomains in a self-assembled block copolymer thin film can be controlled by chemical or physical templating methods. …”
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Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing by Son, Jeong Gon, Chang, Jae-Byum, Berggren, Karl K., Ross, Caroline A.

“…These techniques extend the capabilities of block copolymer lithography, enabling complex aperiodic nanoscale patterns to be formed from a single block copolymer thin film.…”
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