Two-dimensional imaging of crystal phase and stress component by micro-Raman spectroscope equipped with integral field unit by Tatsuhiro YAMADA, Daijiro TANIGUCHI, Hirohisa KIMACHI

“…Micro-Raman spectroscopy is used to measure phases, stresses and strains in microstructures comprising semiconductor materials, such as Si. However, the two-dimensional Raman imaging techniques for directly observing phases and measuring stresses and strains in a large area are required. …”
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