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Low-temperature synthesis of carbon nanotubes via floating catalyst chemical vapor deposition method
Published 2011“… Carbon nanotubes (CNTs) are widely synthesized at high temperatures via floating catalyst chemical vapor deposition (FC-CVD) method. It is important to reduce the synthesis temperature of CNTs to allow better control of the reactor's conditions and to eliminate the formation of carbon by-products. …”
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Floating catalyst chemical vapor deposition method of synthesizing carbon nanotubes and carbon nanofibers-CVD.
Published 2004“…This invention relates to a method of producing a carbon nanotubes (CNTs) and carbon nanofibers (CNFs), and more particularly, to a method of producing carbon nanotubes and carbon nanofibers using floating catalysts Chemical Vapor Deposition (CVD). According to the present invention, benzene gas is used as a carbon source for the synthesis of CNTs and CNFs under chemical vapor deposition conditions at a reaction temperature range from about 600 to 1200. …”
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Low-temperature synthesis of carbon nanotubes via floating catalyst-chemical vapor deposition method
Published 2010Subjects: Get full text
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Fluidized bed chemical vapor deposition synthesis of carbon nanotubes and its application for cellulase immobilization
Published 2010“…However, Fluidized Bed Chemical Vapor Deposition (FBCVD) is still in its infancy and further studies and innovations are needed. …”
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245
Aerosol-assisted chemical vapor deposition of metal oxide thin films for photoelectrochemical water splitting
Published 2015“…Aerosol-assisted chemical vapor deposition (AACVD) is discussed as a promising fabrication method for the materialization of thin films in terms of their homogeneity and uniformity. …”
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Position-controlled formation of Si nanopores by chemical vapor deposition of SiC/SOI(100)
Published 2011“…We investigated the position-controlled nanopore formation in the surface of thin Si layer of a Silicon on Insulator (SOI) substrate by utilizing chemical vapor deposition (CVD). The Si membrane was obtained by anisotropic etching of the handle wafer. …”
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Structure and electrical properties of gallium arsenide nanowires grown by metal organic chemical vapor deposition
Published 2011“…Gallium Arsenide nanowires (GaAs NWs) have been grown on GaAs and Silicon (Si) substrates by gold-assisted and using metal-organic chemical vapor deposition (MOCVD) method. The structural properties and electrical conductivity were studied and was found to be strongly dependent on the pre-annealing temperature, growth temperature, growth period and V/III ratio. …”
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249
InAs/GaAs quantum dots grown by metal organic chemical vapor deposition at different temperatures
Published 2008“…InAs/GaAs quantum dots (QDs) were grown by low pressure Metal Organic Chemical Vapor Deposition in Stranski-Krastanov growth mode. …”
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Synthesis of zeolite templated graphene (ZTG) from methanol via chemical vapor deposition (CVD) method /
Published 2013Subjects: “…Chemical vapor deposition…”
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Growth of InAs Quantum Dots on Germanium Substrate Using Metal Organic Chemical Vapor Deposition Technique
Published 2009-01-01“…<p>Abstract</p> <p>Self-assembled InAs quantum dots (QDs) were grown on germanium substrates by metal organic chemical vapor deposition technique. Effects of growth temperature and InAs coverage on the size, density, and height of quantum dots were investigated. …”
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Metalorganic Chemical Vapor Deposition of AlN on High Degree Roughness Vertical Surfaces for MEMS Fabrication
Published 2024-04-01“…The impact of the surface roughness (Rq) of the vertical sidewalls formed in Si using wet and dry etching methods on the crystal quality, crystallographic orientation, and uniformity of the metalorganic chemical vapor deposited (MOCVD) AlN thin films is studied in this paper. …”
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Synthesis of Multiwalled Carbon Nanotubes on Stainless Steel by Atmospheric Pressure Microwave Plasma Chemical Vapor Deposition
Published 2020-06-01“…In this paper, we synthesize carbon nanotubes (CNTs) by using atmospheric pressure microwave plasma chemical vapor deposition (AMPCVD). In AMPCVD, a coaxial plasma generator provides 200 W 2.45 GHz microwave plasma at atmospheric pressure to decompose the precursor. …”
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Three-Dimensional (3D) Device Architectures Enabled by Oxidative Chemical Vapor Deposition (oCVD)
Published 2022-12-01Subjects: “…oxidative chemical vapor deposition (ocvd)…”
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Article