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321
Plasmons in AlGaN/GaN grating-gate structure probing with 300 K background illumination
Published 2023-09-01“…We show that terahertz plasmons in AlGaN/GaN grating-gate structures efficiently modulate the reflection of room temperature thermal radiation, leading to spectra that are in agreement with the measurements of plasmon absorption using high-power external sources. …”
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Article -
322
Growth Uniformity in Selective Area Epitaxy of AlGaN/GaN Heterostructures for the Application in Semiconductor Devices
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Article -
323
Proton irradiation impact on interface traps under Schottky contact in AlGaN/GaN heterostructure
Published 2020-06-01“…The effect of 3 MeV proton irradiation on interface traps under a Schottky contact in an AlGaN/GaN heterostructure has been investigated in this work. …”
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Article -
324
Carrier Trap and Their Effects on the Surface and Core of AlGaN/GaN Nanowire Wrap-Gate Transistor
Published 2023-07-01Subjects: Get full text
Article -
325
Excitation Intensity and Temperature-Dependent Performance of InGaN/GaN Multiple Quantum Wells Photodetectors
Published 2020-11-01“…In this article, we investigate the behavior of InGaN–GaN Multiple Quantum Well (MQW) photodetectors under different excitation density (616 µW/cm<sup>2</sup> to 7.02 W/cm<sup>2</sup>) and temperature conditions (from 25 °C to 65 °C), relating the experimental results to carrier recombination/escape dynamics. …”
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Article -
326
Normally-Off AlGaN/GaN HEMTs With a Low Reverse Conduction Turn-On Voltage
Published 2023-01-01Subjects: Get full text
Article -
327
Enhancement-mode AlGaN/GaN HEMTs with high linearity fabricated by hydrogen plasma treatment
Published 2010“…Enhancement-mode (E-mode) AlGaN/GaN high electron mobility transistors (HEMTs) are highly desirable for power and digital electronic circuits. …”
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Article -
328
High Breakdown ( > \hbox {1500 V} ) AlGaN/GaN HEMTs by Substrate-Transfer Technology
Published 2012“…In this letter, we present a new technology to increase the breakdown voltage of AlGaN/GaN high-electron-mobility transistors (HEMTs) grown on Si substrates. …”
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Article -
329
Study of the effect of forward gate bias stress on the reliability of AlGaN/GaN HEMTs on SI
Published 2021“…AlGaN/GaN high electron mobility transistors (HEMTs) have shown promising capabilities for high frequency and high-power applications. …”
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Thesis-Doctor of Philosophy -
330
Enhanced performance of ultraviolet AlGaN/GaN photo-HEMTs by optimized channel isolation schemes
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Journal Article -
331
Growth and characterization of AlGaN/GaN HEMT heterostructures on 100-mm Si (111) by MBE
Published 2013“…To address this, an in-depth study has been done on the growth of GaN layers using AlGaN/AlN and AlN/GaN as stress mitigating layers on Si (111). …”
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Thesis -
332
InGaN/GaN light-emitting diodes : from modeling to their hybrid applications with novel nanomaterials
Published 2017“…In last two decades, InGaN/GaN light-emitting diodes have been one of the main focus of research thanks to their low power consumption, high efficiency, long lifetime, high color purity and color quality, narrow luminescence, possibility to tune the emission wavelength from near ultraviolet to green by increasing the In content, and several other promising properties. …”
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Thesis -
333
Investigation of p-type depletion doping for InGaN/GaN-based light-emitting diodes
Published 2017“…Due to the limitation of the hole injection, p-type doping is essential to improve the performance of InGaN/GaN multiple quantum well light-emitting diodes (LEDs). …”
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Journal Article -
334
Characterization of tunneling and free-carrier screening in coupled asymmetric GaN/AlGaN quantum discs
Published 2007“…We present a systematic investigation of free-carrier screening in coupled asymmetric GaN quantum discs with embedded AlGaN barriers using time-integrated and time-resolved micro-photoluminescence measurements, supported by three-dimensional multi-band k.p computational modeling. …”
Conference item -
335
Towards cavity quantum electrodynamics and coherent control with single InGaN/GaN quantum dots
Published 2013“…<p>Experimental investigations of the optical properties of InGaN/GaN quantum dots are presented. A pulsed laser is used to perform time-integrated and time-resolved microphotoluminescence, photoluminescence excitation, and polarisation-resolved spectroscopy of single InGaN quantum dots under a non-linear excitation regime.…”
Thesis -
336
Optical cavity efficacy and lasing of focused ion beam milled GaN/InGaN micropillars
Published 2012“…Focused ion beam milled micropillars employing upper and lower distributed Bragg reflectors (DBRs) and incorporating InGaN quantum dots were analysed both microstructurally and optically. …”
Journal article -
337
Theoretical and experimental analysis of radiative recombination lifetimes in nonpolar InGaN/GaN quantum dots
Published 2017“…We present here a combined experimental and theoretical analysis of the radiative recombination lifetime in a-plane (11 (Formula presented.) 0) InGaN/GaN quantum dots. The structures have been grown by modified droplet epitaxy and time-resolved photoluminescence measurements have been performed to gain insight into the radiative lifetimes of these structures. …”
Journal article -
338
Positioning of periodic AlN/GaN multilayers: Effect on crystalline quality of a-plane GaN
Published 2020“…We report the effect of 40 pairs of periodic AlN/GaN multilayers on the a-plane undoped-gallium nitride (ud-GaN) grown on r-plane flat sapphire substrate via metal-organic chemical vapor deposition. …”
Article -
339
The Role Of Growth Temperature On The Indium Incorporation Process For Mocvd Growth Of InGaN/GaN Heterostructures
Published 2020“…The InGaN/GaN heterostructures were epitaxially grown on 3.8 μm and 40 nm thick undoped-GaN (ud-GaN) and GaN nucleation layer respectively over a commercial 2” c-plane flat sapphire substrate (FSS). …”
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Conference or Workshop Item -
340
The Role Of Growth Temperature On The Indium Incorporation Process For Mocvd Growth Of InGaN/GaN Heterostructures
Published 2020“…The InGaN/GaN heterostructures were epitaxially grown on 3.8 μm and 40 nm thick undoped-GaN (ud-GaN) and GaN nucleation layer respectively over a commercial 2” c-plane flat sapphire substrate (FSS). …”
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Conference or Workshop Item