Showing 1 - 20 results of 49 for search '"Journal of Microelectronic Manufacturing"', query time: 0.33s Refine Results
  1. 1
    Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization

    Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization by Xu Ma, Zhiqiang Wang, Gonzalo R. Arce

    Published 2018-12-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  2. 2
    Metrology Challenges in 3D NAND Flash Technical Development and Manufacturing

    Metrology Challenges in 3D NAND Flash Technical Development and Manufacturing by Wei Zhang, Jun Xu, Sicong Wang, Yi Zhou, Jian Mi

    Published 2020-03-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  3. 3
    Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition

    Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition by Lei Qu, Rui Chen, Xiaoting Li, Jing Zhang, Yanrong Wang, Shuhua Wei, Jiang Yan, Yayi Wei

    Published 2019-06-01
    “…Journal of Microelectronic Manufacturing…”
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  4. 4
    A Novel High Volume Manufacturing Method for Defect-free and High-yield SiN Micro-sieve Membranes

    A Novel High Volume Manufacturing Method for Defect-free and High-yield SiN Micro-sieve Membranes by Yansong Liu, Chao Zhao, Lisong Dong, Rui Chen, Yaya Wei

    Published 2018-09-01
    “…Journal of Microelectronic Manufacturing…”
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  5. 5
    Self-assembly of Blended PS-b-P2VP Block Copolymers

    Self-assembly of Blended PS-b-P2VP Block Copolymers by Baolin Zhang, Yu Chen, Shisheng Xiong

    Published 2019-12-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  6. 6
    Current Status of the Integrated Circuit Industry in China ― Packaging and Testing Industry Review

    Current Status of the Integrated Circuit Industry in China ― Packaging and Testing Industry Review by Litho World

    Published 2019-12-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  7. 7
    White Light Interference Solution for Novel 3D NAND VIA Dishing Metrology

    White Light Interference Solution for Novel 3D NAND VIA Dishing Metrology by Xiaoye Ding, Sicong Wang, Yi Zhou, Yanzhong Ma, Le Yang, Chi Chen

    Published 2019-12-01
    “…Journal of Microelectronic Manufacturing…”
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  8. 8
    Study on Simulation and Profile Prediction of Atomic Layer Deposition

    Study on Simulation and Profile Prediction of Atomic Layer Deposition by Lei Qu, Chen Li, Jiang Yan, Rui Chen, Jing Zhang, Yanrong Wang, YaYi Wei

    Published 2020-10-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  9. 9
    Current Status of the Integrated Circuit Industry in China ― IC Special Equipment Industry

    Current Status of the Integrated Circuit Industry in China ― IC Special Equipment Industry by Lithotechsolutions.org

    Published 2019-03-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  10. 10
    High-Pressure Oxidation on Ge: Improvement of Ge/GeO2 Interface and GeO2 Bulk Properties

    High-Pressure Oxidation on Ge: Improvement of Ge/GeO2 Interface and GeO2 Bulk Properties by ChoongHyun Lee

    Published 2020-06-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  11. 11
    Hamamatsu’s Products for Optical Inspection, Metrology and Monitoring to Improve Yield and Accuracy for Semiconductor Processes

    Hamamatsu’s Products for Optical Inspection, Metrology and Monitoring to Improve Yield and Accuracy for Semiconductor Processes by Chenghao Xiang, Xusheng Zhou

    Published 2019-03-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  12. 12
    Current Status of the Integrated Circuit Industry in China —— IC Design Industry

    Current Status of the Integrated Circuit Industry in China —— IC Design Industry by Lithotechsolutions.org

    Published 2018-08-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  13. 13
    Key Process Approach Recommendation for 5 nm Logic Process Flow with EUV Photolithography

    Key Process Approach Recommendation for 5 nm Logic Process Flow with EUV Photolithography by Yushu Yang, Yanli Li, Qiang Wu, Jianjun Zhu, Shoumian Chen

    Published 2020-03-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  14. 14
    Study of Inverse Lithography Approaches based on Deep Learning

    Study of Inverse Lithography Approaches based on Deep Learning by Xianqiang Zheng, Xu Ma, Shengen Zhang, Yihua Pan, Gonzalo R. Arce

    Published 2020-10-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  15. 15
    Generative Learning in VLSI Design for Manufacturability: Current Status and Future Directions

    Generative Learning in VLSI Design for Manufacturability: Current Status and Future Directions by Mohamed Baker Alawieh, Yibo Lin, Wei Ye, David Z. Pan

    Published 2019-12-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  16. 16
    A Simulation Study for Typical Design Rule Patterns in 5 nm Logic Process with EUV Photolithographic Process

    A Simulation Study for Typical Design Rule Patterns in 5 nm Logic Process with EUV Photolithographic Process by Yanli Li, Qiang Wu, Shoumian Chen

    Published 2019-12-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  17. 17
    Patterning Defect Study for Process Integration Engineering Using Pattern Fidelity Monitoring with Review SEM Images

    Patterning Defect Study for Process Integration Engineering Using Pattern Fidelity Monitoring with Review SEM Images by Yu Zhang, Abhishek Vikram, Ming Tian, Tianpeng Guan, Jianghua Leng, Baojun Zhao, Lei Yan, Wei Hu, Guojie Chen, Hui Wang, Gary Zhang, Wenkui Liao

    Published 2019-06-01
    “…Journal of Microelectronic Manufacturing…”
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  18. 18
    Preparation of Double-sided Nanostructure Based on Soft-nanoimprinting Lithography

    Preparation of Double-sided Nanostructure Based on Soft-nanoimprinting Lithography by Man Zhang, Qiling Deng, Hui Pang, Lifang Shi, Axiu Cao

    Published 2018-12-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  19. 19
    Recognition and Visualization of Lithography Defects based on Transfer Learning

    Recognition and Visualization of Lithography Defects based on Transfer Learning by Bo Liu, Pengzheng Gao, Libin Zhang, Jiajin Zhang, Yuhong Zhao, Yayi Wei

    Published 2020-10-01
    “…Journal of Microelectronic Manufacturing…”
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    Article
  20. 20
    Current Status of the Integrated Circuit Industry in China ― Overview of the Memory Industry

    Current Status of the Integrated Circuit Industry in China ― Overview of the Memory Industry by Litho World

    Published 2020-06-01
    “…Journal of Microelectronic Manufacturing…”
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    Article

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