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High Threshold Voltage Normally off Ultra-Thin-Barrier GaN MISHEMT with MOCVD-Regrown Ohmics and Si-Rich LPCVD-SiNx Gate Insulator
Published 2020-05-01Subjects: Get full text
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182
Study of Phase Transition in MOCVD Grown Ga<sub>2</sub>O<sub>3</sub> from κ to β Phase by Ex Situ and In Situ Annealing
Published 2021-01-01Subjects: “…MOCVD…”
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The Role of Carbon in Metal–Organic Chemical Vapor Deposition-Grown MoS<sub>2</sub> Films
Published 2023-11-01Subjects: “…MOCVD…”
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186
High-Power Mid-Infrared Quantum Cascade Laser with Large Emitter Width
Published 2024-02-01Subjects: Get full text
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187
Role of Vacancy Defects in Reducing the Responsivity of AlGaN Schottky Barrier Ultraviolet Detectors
Published 2022-09-01Subjects: Get full text
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The Effect of a Nucleation Layer on Morphology and Grain Size in MOCVD-Grown β-Ga<sub>2</sub>O<sub>3</sub> Thin Films on C-Plane Sapphire
Published 2022-11-01Subjects: Get full text
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190
Study of HgCdTe (100) and HgCdTe (111)B Heterostructures Grown by MOCVD and Their Potential Application to APDs Operating in the IR Range up to 8 µm
Published 2022-01-01“…The paper presents research on the potential application of the HgCdTe (100) oriented and HgCdTe (111)B heterostructures grown by metal-organic chemical vapor deposition (MOCVD) on GaAs substrates for the design of avalanche photodiodes (APDs) operating in the IR range up to 8 µm and under 2-stage TE cooling (<i>T</i> = 230 K). …”
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Electronic surface, optical and electrical properties of p – GaN activated via in-situ MOCVD and ex-situ thermal annealing in InGaN/GaN LED
Published 2020“…In-situ annealing process took place in Metal Oxide Chemical Vapor Deposition (MOCVD) chamber while ex-situ annealing process was carried out in the conventional oven. …”
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Photocatalytic Degradation of Methyl Orange and Methylene Blue Dyes by Engineering the Surface Nano-Textures of TiO<sub>2</sub> Thin Films Deposited at Different Temperatures via MOCVD
Published 2023-01-01“…TiO<sub>2</sub> thin films were deposited on quartz substrates by metal–organic chemical vapor deposition (MOCVD) at temperatures of 250, 350, and 450 °C. X-ray diffraction (XRD) data revealed the production of a pure anatase phase, a decrease in crystallite size, and a textural change as deposition temperature increased. …”
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196
InGaN-Based microLED Devices Approaching 1% EQE with Red 609 nm Electroluminescence on Semi-Relaxed Substrates
Published 2021-11-01Subjects: “…MOCVD…”
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197
Mechanism of defects and electrode structure on the performance of AlN-based metal semiconductor metal detectors
Published 2021-01-01Subjects: Get full text
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198
Heteroepitaxy Growth and Characterization of High-Quality AlN Films for Far-Ultraviolet Photodetection
Published 2022-11-01Subjects: Get full text
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199
Growth of p-type GaN – The role of oxygen in activation of Mg-doping
Published 2023-06-01Subjects: Get full text
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200
Deposition of Gadolinia-Doped Zirconia Layers Using Metalorganic Compounds at Low Temperatures
Published 2021-12-01Subjects: Get full text
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