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Modeling of submicron MOSFETs
Published 2009“…The Lightly Doped Drain (LDD) structure is the current-art transistor structure for fabricating submicron and deep-submicron Metal-Oxide-Semiconductor Field-Effect-Transistors (MOSFETs). This thesis describes a simple and efficient (computer-time less intensive) model for predicting the LDD MOSFET current-voltage (I-V) characteristics.…”
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Thesis -
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Power Consumption of a MOSFET
Published 2010-01-01“…A MOSFET is defined as metal oxide semiconductor field effect transistor. …”
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Simulation of Resistance Modulation in MOSFETs
Published 2007-09-01“… Simulation results for the resistance modulation in metal-semiconductor field effect transistors (MOSFETs) are presented. The numerical simulations show that the resistance fluctuation does increase as the trap area is reduced, passes through a maximum and finally decrease towards zero. …”
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Coulomb Blockade in Narrow MOSFETs
Published 2010Subjects: “…Coulomb Blockade in Narrow MOSFETs…”
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Technical Report -
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Numerical exploration of asymmetrical MOSFETs
Published 2009“…Ideal MOSFET is intrinsically symmetrical in source and drain, and all existing models describing MOSFETs are built with this structural symmetry. …”
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Scaling and numerical simulation analysis of 50nm MOSFET incorporating dielectric pocket (DP-MOSFET)
Published 2007“…A better control of VT roll-off was also demonstrated better for MOSFET with DP as compared to conventional MOSFET. …”
Conference or Workshop Item -
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Scaling and numerical simulation analysis of 50 nm MOSFET incorporating dielectric pocket (DP-MOSFET)
Published 2008“…A better control of VT roll-off was also demonstrated better for MOSFET with DP as compared to conventional MOSFET. …”
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