Plasma technology in wool / by Kan, C. W., C. W. M. Kuen

Subjects: “…Plasma etching…”

Plasma etching in semiconductor fabrication / by 217469 Morgan, Russ A.

Subjects: “…Plasma etching…”

Plasma processes for semiconductor fabrication / by 414824 Hitchon, W. Nicholas G.

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Studies on etching and polymer deposition in halocarbon plasmas by Astell-Burt, P, Astell-Burt, Peter J.

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Studies of the chemistry of plasmas used for semiconductor etching by Toogood, M, M. J. Toogood

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Plasma-surface interactions and processing of materials / by NATO Advanced Study Institute on Plasma-Surface International and Processing of materials (1988 : Alicante, Spain), Auciello, Orlando

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Applications of plasma processes to VLSI technology/ by Sugano, Takuo

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Dry etching for VLSI / by 198063 Roosmalen, A. J. Van, Baggerman, J. A. G., Brader, S. J. H.

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Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / by Rossnagel, Stephen M., Cuomo, Jerome J., Westwood, William D. (William Dickson), 1937-

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Modeling of discharges in a capacitively coupled dual frequency plasma reactor by Bojarov Aleksandar, Radmilović-Rađenović Marija, Petrović Zoran Lj.

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Effect of Plasma Etching Depth on Subsurface Defects in Quartz Crystal Elements by Qingzhi Li, Yubin Zhang, Zhaohua Shi, Weihua Li, Xin Ye

Subjects: “…plasma etching…”
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Photon-assisted processing of surfaces and thin films / by Symposium B on Photon-Assisted Processing of Surfaces and Thin Films (1994 : Strasbourg, France), Dieleman, J., Biermann, U. K. P., Hess, P.

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Dry Phosphorus silicate glass etching and surface conditioning and cleaning for multi-crystalline silicon solar cell processing by Ahmed S. Kagilik

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Manipulation of the Superhydrophobicity of Plasma-Etched Polymer Nanostructures by Ke Du, Youhua Jiang, Yuyang Liu, Ishan Wathuthanthri, Chang-Hwan Choi

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Properties of Al contacts to Si surface exposed in the course of plasma etching of previously grown nanocrystalline c-BN film by Piotr Firek, Aleksander Werbowy, Jan Szmidt, Andrzej R. Olszyna

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Principles of plasma discharges and materials processing / by Lieberman, M. A. (Michael A.), Lichtenberg, Allan J.

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SF6 Optimized O2 Plasma Etching of Parylene C by Lingqian Zhang, Yaoping Liu, Zhihong Li, Wei Wang

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Ultra-low friction, superhydrophobic, plasma micro-nanotextured fluorinated ethylene propylene (FEP) surfaces by Kosmas Ellinas, Evangelos Gogolides

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High-pressure plasma etching up to 9 atm toward uniform processing inside narrow grooves of high-precision X-ray crystal optics by Shotaro Matsumura, Iori Ogasahara, Masafumi Miyake, Taito Osaka, Daisetsu Toh, Jumpei Yamada, Makina Yabashi, Kazuto Yamauchi, Yasuhisa Sano

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Database Development of SiO₂ Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe by Youngseok Lee, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee, ShinJae You

Subjects: “…plasma etching…”
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