Development and Evaluation of MCC-SiO₂/CMC-SiO₂ Conjugates as Tablet Super-Disintegrants by Tanikan Sangnim, Simran Kaur Zandu, Sukhanpreet Kaur, Oluwatoyin A. Odeku, Kampanart Huanbutta, Inderbir Singh

“…In the present study, microcrystallinecellulose–colloidal silicon dioxide (MCC-SiO₂) and carboxymethylcellulose–colloidal silicon dioxide (CMC-SiO₂) conjugates have been investigated as superdisintegrants in fast dissolving tablets (FDTs). …”
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Design of a high-speed, meso-scale nanopositioners driven by electromagnetic actuators by Golda, Dariusz, 1979-

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Platform for monolithic integration of III-V devices with Si CMOS technology by Pacella, Nan Yang

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Characterization of bonded copper interconnects for three-dimensional integrated circuits by Tadepalli, Rajappa, 1979-

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A New Bivariate Family Based on Archimedean Copulas: Simulation, Regression Model and Application by Gabriela M. Rodrigues, Edwin M. M. Ortega, Roberto Vila, Gauss M. Cordeiro

“…We construct a bivariate regression model based on the new family to fit oak lettuce plant data for different concentrations of silicon dioxide and organosilicon compounds. We check the response variables fresh weight and plant height together in order to verify the existing correlation between them. …”
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Absorption Spectra of a Graphene Embedded One Dimensional Fibonacci Aperiodic Structure by hadi Rahimi

“…In this paper, we explore the linear response of one dimensionalquasiperiodic structure based on Fibonacci sequence composed of silicon dioxide,polystyrene and graphene materials. Here, a graphene monolayer is sandwichedbetween two adjacent layers. …”
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In situ–Directed Growth of Organic Nanofibers and Nanoflakes: Electrical and Morphological Properties by de Oliveira Hansen Roana, Madsen Morten, Kjelstrup-Hansen Jakob, Rubahn Horst-Günter

“…Here, we demonstrate in situ–directed growth of such organic nanostructures between pre-fabricated contacts, which are source–drain gold electrodes on a transistor platform (bottom-gate) on silicon dioxide patterned by a combination of optical lithography and electron beam lithography. …”
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NEW METHOD OF PRODUCTION OF ALUNINUM SILICON ALLOYS by V. K. Afanasiev, E. L. Marukovich, M. N. Churik, V. V. Gertsen, A. V. Gorshenin, V. A. Samon

“…A new approach to the preparation of aluminum-silicon alloys, based on the concept of the leading role of hydrogen in determining the structure and properties of alloys consists in using as charge materials of silicon dioxide (silica) and hydrogen instead of crystalline silicon was described. …”
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Different types of adsorbents for selenium (Se) removal from water: A review by Marjanović Vesna, Marković Radmila, Krstić Vesna

“…Development of adsorption materials based on metal oxides, silicon dioxide, carbon, biosorbents and adsorbents, obtained from natural waste, can be used to remove selenium from water. …”
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Immobilization of the Enzyme Glucose Oxidase on Both Bulk and Porous SiO2 Surfaces by Fulvia Sinatra, Marcella Renis, Antonino Scandurra, Venera Aiello, Sebania Libertino

“…Silicon dioxide surfaces, both bulk and porous, were used to anchor the enzyme glucose oxidase. …”
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RESEARCH PROCESS PLASMA ETCHING SIO2 MEMBRANE by T. A. Ismailov, P. R. Zakharova, B. A. Shangereeva, A. R. Shakhmaeva

“…The article discusses the results of plasma chemical etching of silicon dioxide in the fluorine-containing medium in the manufacture of semiconductor devices. …”
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Fabrication and Characterization of CMOS-MEMS Magnetic Microsensors by Ming-Zhi Yang, Ching-Liang Dai, Chen-Hsuan Hsieh

“…The post-process uses an anisotropic dry etching to etch the silicon dioxide layer and an isotropic dry etching to remove the silicon substrate. …”
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High-k hafnium oxide based thin films using laser molecular beam epitaxy for gate dielectrics by Lu, Yuekang

“…The constant increase in integrated circuit densities predicted by Moore’s law requires the continuous reduction of the CMOS device dimensions such as the gate length, gate oxide thickness, etc. Silicon dioxide (SiO2) has been used as the gate oxide and been aggressively scaled for more than 30 years. …”
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Samples search and study of electronic ceramics for electrical and electronic devices by Shi, Miaoyan.

“…The transparent materials such as aluminum oxide, aluminum nitride, yttrium oxide, yttrium aluminum garnet (YAG), and silicon dioxide will be discussed. By learning various exotic samples and chips, and understand basic principles for applications in these devices.…”
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‘Cut and stick’ ion gels as effective dielectrics for synaptic transistors by Chen, Yaoyi

“…More importantly, we find out that in contrast with the conventional silicon dioxide gates, stronger synaptic behaviors can be induced by the ‘cut and stick’ ion gels at a much lower energy consumption. …”
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Modelling atomic and nanoscale structure in the silicon–oxygen system through active machine learning by Erhard, LC, Rohrer, J, Albe, K, Deringer, VL

“…Beyond the well-known silicon dioxide, there are phases with different stoichiometric composition and nanostructured composites. …”

Assessing Potential Supports for Lithium Amide-imide Ammonia Decomposition Catalysts by Wood, T, Makepeace, J

“…In this study, lithium amide-imide was tested for compatibility with various support materials (activated carbon, silicon dioxide, aluminum oxide and magnesium oxide). …”

Conductance studies on sodium silicates by Lee, C. K., Dent Glasser, L. S.

“…Sodium silicate solutions with silicon dioxide: sodium monoxide mole ratios of 3.41 : 1 and 3.98 : 1 were dried to form gels. …”
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Anodization Of Zirconium For The Formation Of High-K Dielectric Zirconia (Zro2) Thin Film by Abidin, Noor Rehan Zainal

“…With the decreasing of the get dielectric thickness (<1.4nm), silicon dioxide (SiO2) layer suffered from basic problem of high tunneling leakage current due to its low dielectric constant (k=3.9). …”
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Multi-layer three-dimensional silicon electronics enabled by wafer bonding by Tan, Chuan Seng, Ph. D. Massachusetts Institute of Technology

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