Highly Aligned Polymeric Nanowire Etch-Mask Lithography Enabling the Integration of Graphene Nanoribbon Transistors by Sangheon Jeon, Pyunghwa Han, Jeonghwa Jeong, Wan Sik Hwang, Suck Won Hong

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Dry etch performance of Novolak-based negative e-beam resist by Rahul Singh, Christian Vinther Bertelsen, Maria Dimaki, Winnie Edith Svendsen

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Selective Plasma Etching of Polymeric Substrates for Advanced Applications by Harinarayanan Puliyalil, Uroš Cvelbar

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Cavity-BOX SOI: Advanced Silicon Substrate with Pre-Patterned BOX for Monolithic MEMS Fabrication by Marta Maria Kluba, Jian Li, Katja Parkkinen, Marcus Louwerse, Jaap Snijder, Ronald Dekker

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