-
1
Reconditioning of Debonded Pure Titanium Bracket (Using Micro–etcher)
Published 2008-04-01Subjects: “…micro–etcher…”
Get full text
Article -
2
Stainless steal orthodotic brackets recycling ( using micro–etcher )
Published 2007-08-01“…The de–bonded brackets reconditioned with micro–etcher. the data subjected to the statistical analysis at ≤ 0.05 significant level. …”
Get full text
Article -
3
-
4
-
5
Sidewall Slope Control of InP Via Holes for 3D Integration
Published 2021-01-01“…The process for the InP via holes utilizes a common SiO<sub>2</sub> layer as an InP etch mask and conventional inductively coupled plasma (ICP) etcher operated at room temperature and simple gas mixtures of Cl<sub>2</sub>/Ar for InP dry etch. …”
Get full text
Article -
6
Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP
Published 2008“…In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed.…”
Get full text
Thesis -
7
The Language of Line: Chinese Writing, German Speech, and the Visual Poetics of John Winkler’s San Francisco Chinatown Etchings, 1916–1921
Published 2015-01-01“…Arriving in San Francisco in 1912, he studied with the painter and printmaker Frank Van Sloun at the San Francisco Institute of Art, and by the 1920s, he was an internationally celebrated etcher.…”
Get full text
Article -
8
A Cidade Contemporânea a visão de Piranesi
Published 1990-12-01“…The main subject of the thesis "A cidade contemporânea, a visão de Piranesi" (The contemporary city, Piranesi’s view) is the urban space considered through the work of Giovanni Battista Piranesi, a Venetian architect and etcher of the XVIIIth century. It consists of a critical reading of some series of etchings of the artist, followed by a theoretical study, which includes a discussed biography, as well as an analysis of his education, tendencies and influences…”
Get full text
Article -
9
Characterization of deep trench etch recipe
Published 2008“…This thesis presents the Design of Experiments (DOEs) done on deep trench etch recipe using Applied Material's decoupled plasma source reactor, DPS 5200 Centura II Deep Trench Etcher, intended for use in High Voltage Bipolar Transistor (HX) process development as isolation in X-Fab Semiconductor Foundry. …”
Get full text
Thesis -
10
The Correspondence of James McNeill Whistler
Published 2015-11-01“…This article reviews the online-edition of the correspondence of James McNeill Whistler, popular etcher, painter and pivotal figure in English and French artistic circles of the second half of the 19th century. …”
Get full text
Article -
11
The Process of Ultra Low-Volume Seed Etching by an Experimental Device
Published 2021-01-01“…One of the conditions for operation of the etcher is the possibility of connecting to the compressor unit and the electricity network. …”
Get full text
Article -
12
Optimization of reactive-ion etching (RIE) parameters for fabrication of tantalum pentoxide (Ta2O5) waveguide using Taguchi method
Published 2017-01-01“…In this paper, we demonstrate the optimization of reactive-ion etching (RIE) parameters for the fabrication of tantalum pentoxide (Ta2O5) waveguide with chromium (Cr) hard mask in a commercial OIPT Plasmalab 80 RIE etcher. A design of experiment (DOE) using Taguchi method was implemented to find optimum RF power, mixture of CHF3 and Ar gas ratio, and chamber pressure for a high etch rate, good selectivity, and smooth waveguide sidewall. …”
Get full text
Article -
13
Evaluation of Integrity of Mesh of Different Orthodontic Brackets
Published 2011-04-01“…Aims: To evaluate and compare the effect of micro etcher model II on geometrical integrity of base of variable types of orthodontic brackets after etching and compared with new bracket. …”
Get full text
Article -
14
Growth and Characterisation of Pulsed-Laser Deposited Tin Thin Films on Cube-Textured Copper at Different Temperatures
Published 2016-06-01“…The X-Ray diffraction measurement revealed presence of high peaks belonged to TiN(200) and TiN(111) thin films, depending on used etcher of copper surface. The electron diffraction patterns of TiN(200)/Cu films confirmed the single-crystal nature of the films with cube-on-cube epitaxy. …”
Get full text
Article -
15
A new method to form Au particle on silicon wafer
Published 2013“…However, we need understand the relationship between Au particle size and RIE etch rate and etch rates were studied for various gas compositions, chamber pressures and power using a parallel plate reactive ion etcher. The etch process developed uses an eight inch oxidized silicon wafer, which serves as the substrate platter. …”
Get full text
Final Year Project (FYP) -
16
Ultra-low friction, superhydrophobic, plasma micro-nanotextured fluorinated ethylene propylene (FEP) surfaces
Published 2022-04-01“…Two different plasma reactors (an inductively coupled reactor and a reactive ion etcher) and different etching conditions are used in order to micro-nanotexture FEP surfaces. …”
Get full text
Article -
17
Appunti sulle immagini negli scritti di Giraldi Cinthio
Published 2019-11-01“…The examination of two novelle from the Ecatommiti (VII 1 and VII 10), whose protagonists are artists (the bolognese etcher Giovanni Bernardi and Michelangelo respectively), will reveal the theoretical, poetical and ideological implications of Giraldi’s views on the affinity between verbal art and visual art. …”
Get full text
Article -
18
-
19
Development of an Atomic-Oxygen-Erosion-Resistant, Alumina-Fiber-Reinforced, Fluorinated Polybenzoxazine Composite for Low-Earth Orbital Applications
Published 2022-12-01“…The low-Earth orbit atomic-oxygen erosion rate was simulated by an RF plasma asher/etcher. The atomic-oxygen resistance of poly(BAF-oda-fu) fell along an established trend line based on its fluorine content.…”
Get full text
Article -
20
The Evaluatıon Of Dıfferent Roughenıng Methods On The Retentıon Of Orthodontıc Bands
Published 1996-04-01“…In spite of this, on the micrographs of the roughened surfaces with micro-etcher were seen many homogeneous retentive surfaces with thousands of microscopic undercuts The failure site on all rough bands was observed at the cement-band interface, leaving the cement adhered to the band, oppositely to the control group where, following to the failure, the cement was observed adhered to the enamel surface. …”
Get full text
Article