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    Effect of annealing temperature on properties of SiO<sub>2</sub>/Si<sub>3</sub>N<sub>4</sub> optical films prepared by PECVD method

    Effect of annealing temperature on properties of SiO<sub>2</sub>/Si<sub>3</sub>N<sub>4</sub> optical films prepared by PECVD method by WU Li-yu, LI Xiao-qiang, WANG Bin, QU Sheng-guan

    Published 2020-12-01
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