Dual-Point Technique for Multi-Trap RTN Signal Extraction by Xuepeng Zhan, Yifang Xi, Qianwen Wang, Weiqiang Zhang, Zhigang Ji, Jiezhi Chen

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First-Principles Study of Point Defects in LaAlO₃ by Zheng, J.X., Ceder, Gerbrand, Chim, Wai Kin, Choi, Wee Kiong

Subjects: “…High-K Gate Dielectrics…”
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The Impact of Width Downscaling on the High-Frequency Characteristics of InGaAs Nanowire FETs by P. Huang, Q. H. Luc, A. Sibaja-Hernandez, H. L. Ko, J. Y. Wu, N. A. Tran, N. Collaert, E. Y. Chang

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High current density 1.2 kV class HfO2-gated vertical GaN trench MOSFETs by Andrew T. Binder, Jeffrey Steinfeldt, Kevin J. Reilly, Richard S. Floyd, Peter T. Dickens, Joseph P. Klesko, Andrew A. Allerman, Robert J. Kaplar

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New observations on the correlation between hole-trapping transformation and SILC generation under NBTI stressing by Boo, Ann Ann, Tung, Zhi Yan, Ang, Diing Shenp

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Evaluation of MOSFETs with crystalline high-k gate-dielectrics: device simulation and experimental data by Florian Zaunert, Ralf Endres, Yordan Stefanov, Udo Schwalke

Subjects: “…crystalline high-k gate dielectric…”
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Characterization of High-Performance InGaAs QW-MOSFETs With Reliable Bi-Layer HfO_xN_y Gate Stack by Su-Keun Eom, Min-Woo Kong, Ho-Young Cha, Kwang-Seok Seo

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Interface Optimization and Performance Enhancement of Er₂O₃-Based MOS Devices by ALD-Derived Al₂O₃ Passivation Layers and Annealing Trea... by Qiuju Wu, Qing Yu, Gang He, Wenhao Wang, Jinyu Lu, Bo Yao, Shiyan Liu, Zebo Fang

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Interface Optimization and Transport Modulation of Sm₂O₃/InP Metal Oxide Semiconductor Capacitors with Atomic Layer Deposition-Derived Laminated Interlayer by Jinyu Lu, Gang He, Jin Yan, Zhenxiang Dai, Ganhong Zheng, Shanshan Jiang, Lesheng Qiao, Qian Gao, Zebo Fang

Subjects: “…Sm₂O₃ high-k gate dielectric…”
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H₂ Plasma and PMA Effects on PEALD-Al₂O₃ Films with Different O₂ Plasma Exposure Times for CIS Passivation Layers by Jehyun An, Kyeongkeun Choi, Jongseo Park, Bohyeon Kang, Hyunseo You, Sungmin Ahn, Rockhyun Baek

Subjects: “…high-k gate dielectric…”
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