Silicone engineered anisotropic lithography for ultrahigh-density OLEDs by Hyukmin Kweon, Keun-Yeong Choi, Han Wool Park, Ryungyu Lee, Ukjin Jeong, Min Jung Kim, Hyunmin Hong, Borina Ha, Sein Lee, Jang-Yeon Kwon, Kwun-Bum Chung, Moon Sung Kang, Hojin Lee, Do Hwan Kim

“…Here, the authors report that silicone-incorporated organic light-emitting semiconductors can achieve anisotropic lithography via reactive ion etching-coupled photolithography, for ultrahigh-density RGB OLED arrays.…”
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Effect of Substrate-Thickness on Voltage Responsivity of MEMS-Based ZnO Pyroelectric Infrared Sensors by Chia-Yen Lee, Cheng-Xue Yu, Kuan-Yu Lin, Lung-Ming Fu

“…Pyroelectric infrared sensors incorporating suspended zinc oxide (ZnO) pyroelectric films and thermally insulated silicon substrates are fabricated using conventional MEMS-based thin-film deposition, photolithography, and etching techniques. The responsivity of the pyroelectric films is improved through annealing at a temperature of 500 °C for 4 h. …”
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A Fabrication Method for Memristors with Graphene Top Electrodes and their Characterization by Selin Onay, Ömer Refet Çaylan, Zarife Göknur Büke, Itır Köymen

“…Microstructures have been fabricated successfully through developing a process flow and patterning graphene using photolithography and lift-off. E-beam evaporation and sputtering were used for depositing bottom metal electrodes and active layer respectively. …”
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A Rapid Prototyping Technique for Microfluidics with High Robustness and Flexibility by Zhenhua Liu, Wenchao Xu, Zining Hou, Zhigang Wu

“…In microfluidic device prototyping, master fabrication by traditional photolithography is expensive and time-consuming, especially when the design requires being repeatedly modified to achieve a satisfactory performance. …”
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Topological Optimization of Circular SAW Resonators: Overcoming the Discreteness Effects by Sergey Yu. Shevchenko, Denis A. Mikhailenko

“…Based on the results of the study, prototyping and printing of ring resonators on a substrate using photolithography will be carried out.…”
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Electrowetting-on-Dielectric Based Economical Digital Microfluidic Chip on Flexible Substrate by Inkjet Printing by He Wang, Liguo Chen

“…In order to get rid of the dependence on expensive photolithography technology and related facilities, an economic and simple design and fabrication technology for digital microfluidics (DMF) is proposed. …”
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pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers by Shah, Mirat

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Wafer level silicon mould fabrication and imprinting of high density microstructures by Wong, T. I., Ong, H. Y., Lu, H. J., Tse, M. S., Quan, C. G., Ng, S. H., Zhou, X.

“…Although the process for making a silicon mould involves only several steps such as photolithography, deep reactive ion etching (DRIE) and nanoimprinting, there are still many issues to be overcome in order to achieve uniformly imprinted patterns on the whole wafer. …”
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Carbon-nanotube-based RF components with multiple applications by Franck, P., Yap, C. C., Brun, C., Pacchini, S., Chow, W. L., Li, H., Baillargeat, D., Tay, B. K.

“…Opportunities are discussed from the fabrication of CNT materials (PECVD, CVD) to their implementation in components and systems by specific technological processes (Photolithography, Flip-Chip, Inkjet printing, etc.). Actual performance of fabricated prototypes and expected improvement based on the CNTs implementation are presented.…”
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PREPARATION OF 110K BI(PB)SRCACUO SUPERCONDUCTING THIN-FILMS BY RF MAGNETRON SPUTTERING AND THEIR RESPONSE TO MICROWAVE-RADIATION by Guldeste, A, Chern, J, Grovenor, C, Goringe, M, Dewhughes, D

“…Microwave response measurements were carried out on a film patterned into a 150 μm wide and 1 cm long meander-type structure using standard photolithography and wet chemical etching. The result showed that the microwave response contains a non-bolometric component. © 1993.…”

A SU-8/PDMS hybrid microfluidic device with integrated optical fibers for online monitoring of lactate. by Wu, M, Cai, H, Xu, X, Urban, J, Cui, Z, Cui, Z

“…It was fabricated by one-step photolithography of SU-8 polymer resist. Different channel widths (50-300 microm) were tested in terms of detection sensitivity. …”

DEPOSITION OF THALLIUM-BASED SUPERCONDUCTING THIN-FILMS BY A SIMPLE THERMAL EVAPORATION METHOD by Lai, H, Vernonparry, K, Chern, J, Grovenor, C

“…In addition, a 150 mu m wide, and 1 cm long, track patterned in one of these films using standard photolithography techniques shows a Tc0 of 102 K, a Jc in excess of 104 A cm-2 at 90 K and a strong bolometric response when illuminated with an He-Ne 1 mW laser.…”

Compact wideband bandpass filter using single corners-cut isosceles triangular patch resonator by Alhawari, Adam Reda Hasan, Ismail, Alyani

“…The proposed filter was designed and fabricated on Taconic CER-10 substrate with a relative dielectric constant of 10 and a thickness of 0.64 mm using standard photolithography process. The final dimension of the proposed filter is measured at 5.7 mm×7.6 mm. …”
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Fabrication of bottom-up multiwalled carbon nanotube electrode for sensitive electrochemical detection by Abdul Rahim, Zulaiha, Yusof, Nor Azah, Mohammad Haniff, Muhammad Aniq Shazni, Syono, Mohd Ismahadi, Daud, Nurulhaidah

“…The study was extended into fabrication of screen-printed electrode system using photolithography methods and the MWCNTs working electrodes were modified under nitrogen plasma to enhance the surface sensitivity.…”
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Micropatterning of non-crystalline methylsilsesquioxane–titania hybrid films based on their structural changes with UV irradiation by Ainuddin, Ainun Rahmahwati, Hakiri, Norio, Muto, Hiroyuki, Matsuda, Atsunori

“…These changes in the physical properties of the films with UV irradiation were caused by the cleavage of Si–C bonds in the films induced by the photocatalytic effect of TiO2.On the basis of the changes in surface profiles, and optical, chemical, and mechanical properties induced by UV irradiation, it is concluded that the methylsilsesquioxane–titania films are promising for micropatterning by photolithography.…”
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A new structure of MMI polymer thermooptic switch with a high refractive index contrast by Al- Hetar, Abdulaziz Mohammed, Mohammad, Abu Bakar, Mohd. Supa'at, Abu Sahmah, Shamsan, Zaid Ahmed, Yulianti, Ian

“…This device was fabricated using standard fabrication techniques such as coating, photolithography, and dry etching. A crosstalk level of -36:2 dB has been achieved. …”
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Resistive humidity sensor made from palm-oil-derived graphene film by Wai, Yin Ling

“…Sensor fabrication process includes photolithography, copper etching and graphene transfer process. …”
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Fabrication of reduced graphene oxide-gated AlGaAs/GaAs heterojunction transistor by Azmi, S. N. C., Rahman, S. F. A., Hashim, A. M.

“…Formation of the rGO gate structure in the device could be obtained by a simple procedure involves photolithography and lift-off process.…”

Characterization of electromagnetic valveless micropump by Rusli, M. Q. A., Chee, P. S., Leow, P. L.

“…Fabrication of the diffuser module can be achieved using photolithography process with a master template and a PDMS prepolymer as the structural material. …”
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Graphene oxide doped SU-8 waveguide and its application as saturable absorber by Mustafa, K. Z., Chong, W. Y., Ibrahim, M. H., Yap, Y. K., Ahmad, F., Lai, C. K., Ariffin, N. A. M., Ahmad, H.

“…The GO-doped SU-8 can be processed using standard photolithography parameters. The optical characteristics of the developed waveguides are determined using fibre-butt coupling and cut-back method. …”