Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures by Fang-Bin Ren, Shi-Cong Jiang, Chia-Hsun Hsu, Xiao-Ying Zhang, Peng Gao, Wan-Yu Wu, Yi-Jui Chiu, Shui-Yang Lien, Wen-Zhang Zhu

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Surface modification of Sr2Fe1.5Mo0.5O6-δ perovskite electrode with Ru nanoparticles via plasma-enhanced atomic layer deposition for solid oxide fuel cells by Shin, Jeong Woo, Park, Geonwoo, Shin, Jiyoon, Li, Hao-Yang, An, Jihwan, Su, Pei-Chen

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Structural, Surface, and Optical Properties of AlN Thin Films Grown on Different Substrates by PEALD by Sanjie Liu, Yangfeng Li, Jiayou Tao, Ruifan Tang, Xinhe Zheng

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Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD by Markus Neuber, Maximilian Walter Lederer, Konstantin Mertens, Thomas Kämpfe, Malte Czernohorsky, Konrad Seidel

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Plasma-Enhanced Atomic Layer Deposition-Based Ferroelectric Field-Effect Transistors by Chinsung Park, Prasanna Venkat Ravindran, Dipjyoti Das, Priyankka Gundlapudi Ravikumar, Chengyang Zhang, Nashrah Afroze, Lance Fernandes, Yu Hsin Kuo, Jae Hur, Hang Chen, Mengkun Tian, Winston Chern, Shimeng Yu, Asif Islam Khan

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Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO<sub... by William Chiappim, Giorgio Testoni, Felipe Miranda, Mariana Fraga, Humber Furlan, David Ardiles Saravia, Argemiro da Silva Sobrinho, Gilberto Petraconi, Homero Maciel, Rodrigo Pessoa

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Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings by Aleksandra Radtke, Tomasz Jędrzejewski, Wiesław Kozak, Beata Sadowska, Marzena Więckowska-Szakiel, Ewa Talik, Maarit Mäkelä, Markku Leskelä, Piotr Piszczek

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Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition by B. B. Wu, H. M. Zheng, Y. Q. Ding, W. J. Liu, H. L. Lu, P. Zhou, L. Chen, Q. Q. Sun, S. J. Ding, David W. Zhang

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MOS Capacitance Measurements for PEALD TiO₂ Dielectric Films Grown under Different Conditions and the Impact of Al₂O₃ Partial-Monolayer Insertion by William Chiappim, Marcos Watanabe, Vanessa Dias, Giorgio Testoni, Ricardo Rangel, Mariana Fraga, Homero Maciel, Sebastião dos Santos Filho, Rodrigo Pessoa

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Interplay of Precursor and Plasma for The Deposition of HfO2 via PEALD: Film Growth and Dielectric Properties by Florian Preischel, David Zanders, Thomas Berning, Aleksander Kostka, Detlef Rogalla, Claudia Bock, Anjana Devi

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Characterization of HZO Films Fabricated by Co-Plasma Atomic Layer Deposition for Ferroelectric Memory Applications by Won-Ji Park, Ha-Jung Kim, Joung-Ho Lee, Jong-Hwan Kim, Sae-Hoon Uhm, So-Won Kim, Hee-Chul Lee

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Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells by Hyun-Jae Woo, Woo-Jae Lee, Eun-Kyong Koh, Seung Il Jang, Shinho Kim, Hyoungseok Moon, Se-Hun Kwon

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Reliability Engineering of High‐Mobility IGZO Transistors via Gate Insulator Heterostructures Grown by Atomic Layer Deposition by Yoon‐Seo Kim, Taewon Hwang, Hye‐Jin Oh, Joon Seok Park, Jin‐Seong Park

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Optimal Aluminum Doping Method in PEALD for Designing Outstandingly Stable InAlZnO TFT by Namgyu Woo, Seong‐In Cho, Sang‐Hee Ko Park

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Neural network modeling and prediction of HfO 2 thin film properties tuned by thermal annealing by Min Gao, Chaoyi Yin, Jianda Shao, Meiping Zhu

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Atomic Layer Deposition of Nanolayered Carbon Films by Zhigang Xiao, Kim Kisslinger, Rebhadevi Monikandan

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Properties and Mechanism of PEALD-In₂O₃ Thin Films Prepared by Different Precursor Reaction Energy by Ming-Jie Zhao, Zhi-Xuan Zhang, Chia-Hsun Hsu, Xiao-Ying Zhang, Wan-Yu Wu, Shui-Yang Lien, Wen-Zhang Zhu

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Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO<i>_x</i> Films at Different Substrate Temperatures by Pao-Hsun Huang, Zhi-Xuan Zhang, Chia-Hsun Hsu, Wan-Yu Wu, Sin-Liang Ou, Chien-Jung Huang, Dong-Sing Wuu, Shui-Yang Lien, Wen-Zhang Zhu

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Curing Process on Passivation Layer for Backside-Illuminated CMOS Image Sensor Application by Jongseo Park, Kyeong-Keun Choi, Jehyun An, Bohyeon Kang, Hyeonseo You, Giryun Hong, Sung-Min Ahn, Rock-Hyun Baek

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Uniformity of HfO₂ Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition by Boyun Choi, Hyeong-U Kim, Nari Jeon

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