Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization by Xu Ma, Zhiqiang Wang, Gonzalo R. Arce

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The Inverse Optimization of Lithographic Source and Mask via GA-APSO Hybrid Algorithm by Junbo Liu, Ji Zhou, Haifeng Sun, Chuan Jin, Jian Wang, Song Hu

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Critical Pattern Selection Method Based on CNN Embeddings for Full-Chip Optimization by Qingyan Zhang, Junbo Liu, Ji Zhou, Chuan Jin, Jian Wang, Song Hu, Haifeng Sun

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Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization by Masaki Kuramochi, Yukihide Kohira, Hiroyoshi Tanabe, Tetsuaki Matsunawa, Chikaaki Kodama

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DFM: “Design for Manufacturing” or “Design Friendly Manufacturing” by Wenzhan Zhou, Hung-Wen Chao, Yu Zhang

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Demonstration of ACO-Based Freeform Source for ArF Laser Immersion Lithography System by Frederick Lie, Chao-Yi Huang, Chun-Sheng Wu, Kao-Tun Chen, Hung-Fei Kuo

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