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    Producing microscale Ge textures via titanium nitride- and nickel-assisted chemical etching with CMOS-compatibiliyty by Liao, Yikai, Shin, Sang-Ho, Jin, Yuhao, Wang, Qi Jie, Kim, Munho

    Published 2022
    “…Schottky contact barrier of metal catalyst with Ge is also investigated indicating similar hole injection efficiency among TiN, Ni, and Ti/Ni with Ge junction due to strong Fermi level pinning effect. The TiN- and Ni-assisted chemical etching of Ge shed light on CMOS-compatible Ge-based photonic and optoelectronic applications.…”
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    Journal Article
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