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921
Producing microscale Ge textures via titanium nitride- and nickel-assisted chemical etching with CMOS-compatibiliyty
Published 2022“…Schottky contact barrier of metal catalyst with Ge is also investigated indicating similar hole injection efficiency among TiN, Ni, and Ti/Ni with Ge junction due to strong Fermi level pinning effect. The TiN- and Ni-assisted chemical etching of Ge shed light on CMOS-compatible Ge-based photonic and optoelectronic applications.…”
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Journal Article -
922
Adhesive curing through low-voltage activation
Published 2017Get full text
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Journal Article -
923
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924
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928
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929
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934
Singapore telecommunications industry (handphone service providers).
Published 2008Get full text
Final Year Project (FYP) -
935
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936
Balance theory and the perception of religious relationships : an application of three quantitative cognitive consistency models in Singapore.
Published 2008Get full text
Final Year Project (FYP) -
937
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938
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939
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940