Binary matrices of optimal autocorrelations as alignment marks by Skirlo, Scott A., Lu, Ling, Soljacic, Marin

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Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication by Rangelow, Ivo W., Ivanov, Tzvetan, Ahmad, Ahmad, Kaestner, Marcus, Lenk, Claudia, Holz, Mathias, Reum, Alexander, Soltani Bozchalooi, Iman, Xia, Fangzhou, Youcef-Toumi, Kamal

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Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography by Berggren, Karl K., Yang, Joel K. W., Cord, Bryan M., Duan, Huigao, Klingfus, Joseph, Nam, Sung-Wook, Kim, Ki-Bum, Rooks, Michael J.

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Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale by Duan, Huigao, Manfrinato, Vitor Riseti, Yang, Joel K. W., Winston, Donald, Cord, Bryan M., Berggren, Karl K.

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Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist by Berggren, Karl K., Duan, Huigao, Winston, Donald, Yang, Joel K. W., Cord, Bryan M., Manfrinato, Vitor Riseti

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Low-cost interference lithography by Fucetola, Corey P., Korre, Hasan, Berggren, Karl K.

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Limiting factors in sub-10 nm scanning-electron-beam lithography by Berggren, Karl K., Cord, Bryan M., Yang, Joel K. W., Duan, Huigao, Joy, David C., Klingfus, Joseph

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Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist by Winston, Donald, Cord, Bryan M., Ming, B., Bell, David C., DiNatale, W. F., Stern, L. A., Vladar, A. E., Postek, M. T., Mondol, Mark K., Yang, Joel K. W., Berggren, Karl K.

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Development of a simple, compact, low-cost interference lithography system by Korre, Hasan, Fucetola, Corey P., Johnson, Jeremiah A., Berggren, Karl K.

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Contrast enhancement behavior of hydrogen silsesquioxane in a salty developer by Nam, Sung-Wook, Rooks, Michael J., Yang, Joel K. W., Berggren, Karl K., Kim, Hyun-Mi, Lee, Min-Hyun, Kim, Ki-Bum, Sim, Jae Hwan, Yoon, Do Yeung

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Low emissivity high-temperature tantalum thin film coatings for silicon devices by Rinnerbauer, Veronika, Senkevich, Jay, Soljacic, Marin, Joannopoulos, John, Celanovic, Ivan L.

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Large-area fabrication of high aspect ratio tantalum photonic crystals for high-temperature selective emitters by Rinnerbauer, Veronika, Ndao, Sidy, Yeng, Yi Xiang, Senkevich, Jay J., Jensen, Klavs F., Joannopoulos, John D., Soljacic, Marin, Celanovic, Ivan, Geil, Robert D.

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Electron-beam-induced deposition of 3-nm-half-pitch patterns on bulk Si by van Oven, J. C., Berwald, F., Berggren, Karl K., Kruit, P., Hagen, C. W.

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Reactive ion etching: Optimized diamond membrane fabrication for transmission electron microscopy by Li, Luozhou, Trusheim, Matthew, Gaathon, Ophir, Kisslinger, Kim, Cheng, Ching-Jung, Lu, Ming, Su, Dong, Yao, Xinwen, Huang, Hsu-Cheng, Bayn, Igal, Wolcott, Abraham, Osgood, Richard M., Englund, Dirk Robert

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Loop formation in graphitic nanoribbon edges using furnace heating or Joule heating by Jia, Xiaoting, Campos-Delgado, Jessica, Gracia-Espino, Edgar Eduardo, Hofmann, Mario, Muramatsu, Hiroyuki, Kim, Yoong Ahm, Hayashi, Takuya, Endo, Morinobu, Kong, Jing, Terrones, Mauricio, Dresselhaus, Mildred

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Three-dimensional nanofabrication using HSQ/PMMA bilayer resists by Do, Hyung Wan, Chang, Jae-Byum, Berggren, Karl K

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Structural change of ion-induced carbon nanofibers by electron current flow by Mohd. Yusop, Mohd. Zamri, Ghosh, Pradip, Hayashi, Akari, Hayashi, Yasuhiko, Tanemura, Masaki, Sasase, Masato

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