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Development and Applications Of Photoflash-Pvdf Technique in Thermal Diffusitivity Measurement at Low Temperatures
Published 2004“…The photoflash technique is developed and used for measuring thermal diffusivity of various types of material, at temperature range from -77K to ambient temperature. …”
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CONDUCTIVITY OF METAL OXIDE SEMICONDUCTOR (MOS) THIN FILMS DUE TO GAS ADSORPTION PROCESS BY USING POINT DEFECT - AND DIFFUSION THEORIES
Published 2007“…In line with polaron and small polaron characteristics then, instead of using Fermi-Dirac statistics, we have assumed in our model that the particle systems are governed by the classical Maxwell-Boltzmann statistics. …”
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