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    Development and Applications Of Photoflash-Pvdf Technique in Thermal Diffusitivity Measurement at Low Temperatures by Haydari, Mehdi

    Published 2004
    “…The photoflash technique is developed and used for measuring thermal diffusivity of various types of material, at temperature range from -77K to ambient temperature. …”
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    Thesis
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    CONDUCTIVITY OF METAL OXIDE SEMICONDUCTOR (MOS) THIN FILMS DUE TO GAS ADSORPTION PROCESS BY USING POINT DEFECT - AND DIFFUSION THEORIES by , Muhamad Darwis Umar, , , Kamsul Abraha

    Published 2007
    “…In line with polaron and small polaron characteristics then, instead of using Fermi-Dirac statistics, we have assumed in our model that the particle systems are governed by the classical Maxwell-Boltzmann statistics. …”
    Article