Skip to content
VuFind
English
Deutsch
Español
Français
Italiano
日本語
Nederlands
Português
Português (Brasil)
中文(简体)
中文（繁體）
Türkçe
עברית
Gaeilge
Cymraeg
Ελληνικά
Català
Euskara
Русский
Čeština
Suomi
Svenska
polski
Dansk
slovenščina
اللغة العربية
বাংলা
Galego
Tiếng Việt
Hrvatski
हिंदी
Հայերէն
Українська
Sámegiella
Монгол
Language
All Fields
Title
Author
Subject
Call Number
ISBN/ISSN
Tag
Find
Advanced
The versatile technique of RF...
Cite this
Text this
Email this
Print
Export Record
Export to RefWorks
Export to EndNoteWeb
Export to EndNote
Permanent link
The versatile technique of RF plasma etching : kinetics of etchant formation /
PSZJBL
Bibliographic Details
Main Author:
427692 Jacob, Adir
Format:
Subjects:
Etching reagents
Holdings
Description
Similar Items
Staff View
Similar Items
The versatile technique of Rf plasma etching : mechanistic considerations for selective etching /
by: 427692 Jacob, Adir
The versatile technique of RF plasma etching : the etch profile /
by: 427692 Jacob, Adir
Economic and technical appraisal of some etchant regeneration systems /
by: 388906 Syed Azman Shah Syed Noordin, et al.
Published: (1989)
The Effects of Etchant on via Hole Taper Angle and Selectivity in Selective Laser Etching
by: Jonghyeok Kim, et al.
Published: (2024-02-01)
Femtosecond Laser Assisted 3D Etching Using Inorganic-Organic Etchant
by: Agnė Butkutė, et al.
Published: (2022-04-01)