Pulsed and pulsed bias sputtering : principles and applications /

Pulsed and pulsed bias sputtering : principles and applications /

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Bibliographic Details
Main Authors: 196569 Barnat, Edward V., Lu, Toh-Ming
Format:
Language:eng
Published: Dordrecht, The Netherlands : Kluwer Academic Publishers, 2003
Subjects:
Cathode sputtering (Plating process)
Thin films

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