Pulsed and pulsed bias sputtering : principles and applications /
22
| Main Authors: | , |
|---|---|
| Format: | |
| Language: | eng |
| Published: |
Dordrecht, The Netherlands : Kluwer Academic Publishers,
2003
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| Subjects: |
| _version_ | 1796701254104121344 |
|---|---|
| author | 196569 Barnat, Edward V. Lu, Toh-Ming |
| author_facet | 196569 Barnat, Edward V. Lu, Toh-Ming |
| author_sort | 196569 Barnat, Edward V. |
| collection | OCEAN |
| description | 22 |
| first_indexed | 2024-03-05T02:11:57Z |
| format | |
| id | KOHA-OAI-TEST:274198 |
| institution | Universiti Teknologi Malaysia - OCEAN |
| language | eng |
| last_indexed | 2024-03-05T02:11:57Z |
| publishDate | 2003 |
| publisher | Dordrecht, The Netherlands : Kluwer Academic Publishers, |
| record_format | dspace |
| spelling | KOHA-OAI-TEST:2741982020-12-19T17:08:49ZPulsed and pulsed bias sputtering : principles and applications / 196569 Barnat, Edward V. Lu, Toh-Ming Dordrecht, The Netherlands : Kluwer Academic Publishers,2003eng22PSZJBLCathode sputtering (Plating process)Thin filmsURN:ISBN:140207543X (hbk.) |
| spellingShingle | Cathode sputtering (Plating process) Thin films 196569 Barnat, Edward V. Lu, Toh-Ming Pulsed and pulsed bias sputtering : principles and applications / |
| title | Pulsed and pulsed bias sputtering : principles and applications / |
| title_full | Pulsed and pulsed bias sputtering : principles and applications / |
| title_fullStr | Pulsed and pulsed bias sputtering : principles and applications / |
| title_full_unstemmed | Pulsed and pulsed bias sputtering : principles and applications / |
| title_short | Pulsed and pulsed bias sputtering : principles and applications / |
| title_sort | pulsed and pulsed bias sputtering principles and applications |
| topic | Cathode sputtering (Plating process) Thin films |
| work_keys_str_mv | AT 196569barnatedwardv pulsedandpulsedbiassputteringprinciplesandapplications AT lutohming pulsedandpulsedbiassputteringprinciplesandapplications |