Structural properties of hydrogenated amorphous silicon (a-Si:H) thin film grown via radio frequency plasma enhanced chemical vapor deposition (RF PECVD) /

Thesis (Sarjana Sains (Fizik)) - Universiti Teknologi Malaysia, 2005

Bibliographic Details
Main Authors:	262770 Hasbullah Anthony Hasbi, Zulkafli Othaman, supervisor, Fakulti Sains
Format:
Language:	eng
Published:	2005
Subjects:	Silicon Amorphous semiconductors Surface chemistry
Online Access:	http://www.psz.utm.my/sla/billing/login.asp?mid=45226

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