Plasma etching in semiconductor fabrication /
40
| Main Author: | |
|---|---|
| Format: | |
| Published: |
Amsterdam : Elservier,
1985
|
| Subjects: |
| _version_ | 1826428467221102592 |
|---|---|
| author | 217469 Morgan, Russ A. |
| author_facet | 217469 Morgan, Russ A. |
| author_sort | 217469 Morgan, Russ A. |
| collection | OCEAN |
| description | 40 |
| first_indexed | 2024-03-05T06:31:01Z |
| format | |
| id | KOHA-OAI-TEST:360495 |
| institution | Universiti Teknologi Malaysia - OCEAN |
| last_indexed | 2024-03-05T06:31:01Z |
| publishDate | 1985 |
| publisher | Amsterdam : Elservier, |
| record_format | dspace |
| spelling | KOHA-OAI-TEST:3604952020-12-19T17:12:31ZPlasma etching in semiconductor fabrication / 217469 Morgan, Russ A. Amsterdam : Elservier,19854012PSZJBLPlasma etchingSemiconductorsURN:ISBN:0444424695 |
| spellingShingle | Plasma etching Semiconductors 217469 Morgan, Russ A. Plasma etching in semiconductor fabrication / |
| title | Plasma etching in semiconductor fabrication / |
| title_full | Plasma etching in semiconductor fabrication / |
| title_fullStr | Plasma etching in semiconductor fabrication / |
| title_full_unstemmed | Plasma etching in semiconductor fabrication / |
| title_short | Plasma etching in semiconductor fabrication / |
| title_sort | plasma etching in semiconductor fabrication |
| topic | Plasma etching Semiconductors |
| work_keys_str_mv | AT 217469morganrussa plasmaetchinginsemiconductorfabrication |